公开(公告)号：US08617653B2

公开(公告)日：2013-12-31

申请号：US12885782

申请日：2010-09-20

申请人： Tsunehiro Watanabe ,  Toshiki Takedutsumi ,  Masanori Yagishita ,  Kiyofumi Mitome ,  Takahito Imai ,  Masatoshi Hashimoto ,  Masaji Uetsuka

发明人： Tsunehiro Watanabe ,  Toshiki Takedutsumi ,  Masanori Yagishita ,  Kiyofumi Mitome ,  Takahito Imai ,  Masatoshi Hashimoto ,  Masaji Uetsuka

IPC分类号： B05D3/02 ,  C09D11/10 ,  C08L39/06

CPC分类号： H01L21/0273 ,  G03F7/40

摘要： It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having photoresist patterns thereon and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, with the applied film of the over-coating agent being removed to form fine patterns, further characterized by comprising a water-soluble polymer which contains a monomeric component and a dimeric component, wherein the total content of the monomeric component and the dimeric component in the water-soluble polymer is reduced to 10 mass % or less, and a method of forming fine patterns using the same. By the present invention, even in reducing the pattern size on a substrate having thereon patterns having different pitches, the heat shrinkage of the over-coating agent can be controlled, irrespective whether the pitch is dense or isolate, thus achieving the pattern size reduction.

摘要翻译： 公开了一种用于形成精细图案的过涂层剂，其被用于覆盖其上具有光刻胶图案的基材并且在加热下使其收缩，使得相邻光致抗蚀剂图案之间的间隔减小，所涂覆的涂膜 被除去以形成精细图案，其特征还在于包含含有单体组分和二聚组分的水溶性聚合物，其中水溶性聚合物中单体组分和二聚组分的总含量降低至10质量％ 以下，以及使用其形成精细图案的方法。 通过本发明，即使在其上具有不同间距的图案的基板上减小图案尺寸，也可以控制外涂层的热收缩，而不管间距是致密的还是隔离的，从而实现图案尺寸的减小。

公开(公告)号：US20110183071A1

公开(公告)日：2011-07-28

申请号：US12885782

申请日：2010-09-20

申请人： Tsunehiro Watanabe ,  Toshiki Takedutsumi ,  Masanori Yagishita ,  Kiyofumi Mitome ,  Takahito Imai ,  Masatoshi Hashimoto ,  Masaji Uetsuka

发明人： Tsunehiro Watanabe ,  Toshiki Takedutsumi ,  Masanori Yagishita ,  Kiyofumi Mitome ,  Takahito Imai ,  Masatoshi Hashimoto ,  Masaji Uetsuka

IPC分类号： C09D139/06 ,  B05D1/32 ,  B05D3/02 ,  C08K5/17

CPC分类号： H01L21/0273 ,  G03F7/40

摘要： It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having photoresist patterns thereon and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, with the applied film of the over-coating agent being removed to form fine patterns, further characterized by comprising a water-soluble polymer which contains a monomeric component and a dimeric component, wherein the total content of the monomeric component and the dimeric component in the water-soluble polymer is reduced to 10 mass % or less, and a method of forming fine patterns using the same. By the present invention, even in reducing the pattern size on a substrate having thereon patterns having different pitches, the heat shrinkage of the over-coating agent can be controlled, irrespective whether the pitch is dense or isolate, thus achieving the pattern size reduction.

摘要翻译： 公开了一种用于形成精细图案的过涂层剂，其被用于覆盖其上具有光刻胶图案的基材并且在加热下使其收缩，使得相邻光致抗蚀剂图案之间的间隔减小，所涂覆的涂膜 被除去以形成精细图案，其特征还在于包含含有单体组分和二聚组分的水溶性聚合物，其中水溶性聚合物中单体组分和二聚组分的总含量降低至10质量％ 以下，以及使用其形成精细图案的方法。 通过本发明，即使在其上具有不同间距的图案的基板上减小图案尺寸，也可以控制外涂层的热收缩，而不管间距是致密的还是隔离的，从而实现图案尺寸的减小。