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公开(公告)号：US20200080189A1
公开(公告)日：2020-03-12
申请号：US16567456
申请日：2019-09-11
发明人： Yuko KATO , Satohiro OKAYAMA , Shuichi OKANO , Takahiro YAJIMA , Takashi OCHI , Takeshi HIRASE , Tsuyoshi SENZAKI , Takuji KATO , Katsuhiko KISHIMOTO , Toru MASUNO
摘要： A flow resistant part having a rod shape is disposed in a raw liquid introduction path in a manner such that the raw liquid is sprayed onto a vaporization plate to reduce the conductance of the raw liquid introduction path with respect to the raw liquid. Because the pressure on an outlet side of the liquid mass flow controller is increased, and the pressure difference from the pressure on the inlet side of the liquid mass flow controller is reduced, the occurrence of cavitation can be prevented. A plurality of the flow resistant parts can be provided.
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公开(公告)号：US20210395880A1
公开(公告)日：2021-12-23
申请号：US17287774
申请日：2019-12-20
申请人： ULVAC, INC.
发明人： Yuko KATO , Takahiro YAJIMA , Fumio NAKAMURA , Yoshinobu UE , Shogo OGURA
摘要： The deposition apparatus includes a chamber including a deposition space, a stage that supports a substrate, a light source, a gas supply, and a heater. The light source includes an emission source that emits an energy ray and is disposed to face the deposition space. The gas supply includes a shower plate and a gas diffusion space. The shower plate includes a first surface that faces the light source, a second surface that faces the stage, and a plurality of through-holes that penetrates the first surface and the second surface, the shower plate allowing the energy ray to transmit therethrough. The gas diffusion space faces the first surface and diffuses raw material gas including an energy ray-curable resin that cures when the energy ray-curable resin is irradiated with the energy ray. The gas supply supplies the raw material gas into the deposition space from the gas diffusion space. The heater heats the first surface of the shower plate.
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