公开(公告)号：US20130312911A1

公开(公告)日：2013-11-28

申请号：US13660304

申请日：2012-10-25

Applicant: UNIMICRON TECHNOLOGY CORPORATION

Inventor： Tzyy-Jang Tseng ,  Tsung-Yuan Chen

IPC: B05B1/00 ,  B05B12/00

CPC classification number: H01L21/6708 ,  H05K3/0085 ,  H05K2203/0746

Abstract: A supplying device including a supplying part and an adjustment part is provided. The supplying part includes a run-through supplying path for transporting a fluid. The adjustment part includes a channel and one or more recovery paths adjacent to the channel. The supplying part is disposed in the channel to allow the fluid to flow out of the channel through the supplying part and to allow the recovery paths to suck a portion of the etching solution outputted from the channel in order to control the amount of output of the fluid. Wet-etching equipment including the supplying device is also provided.

Abstract translation: 提供包括供给部和调整部的供给装置。 供给部包括用于输送流体的贯通供给路径。 调整部分包括通道和与通道相邻的一个或多个恢复路径。 供给部设置在通道中以允许流体通过供应部分流出通道，并且允许回收路径吸收从通道输出的一部分蚀刻溶液，以便控制输出的量 流体。 还提供了包括供应装置的湿蚀设备。