公开(公告)号：US20230384689A1

公开(公告)日：2023-11-30

申请号：US17880700

申请日：2022-08-04

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Shu-Yen LIU ,  Hui-Fang KUO ,  Chian-Ting HUANG ,  Wei-Cyuan LO ,  Yung-Feng CHENG ,  Chung-Yi CHIU

IPC: G03F7/20

CPC classification number: G03F7/70441

Abstract: An optical proximity correction (OPC) device and method is provided. The OPC device includes an analysis unit, a reverse pattern addition unit, a first OPC unit, a second OPC unit and an output unit. The analysis unit is configured to analyze a defect pattern from a photomask layout. The reverse pattern addition unit is configured to provide a reverse pattern within the defect pattern. The first OPC unit is configured to perform a first OPC procedure on whole of the photomask layout. The second OPC unit is configured to perform a second OPC procedure on the defect pattern of the photomask layout to enhance an exposure tolerance window. The output unit is configured to output the photomask layout which is corrected.