-
公开(公告)号:US20240038483A1
公开(公告)日:2024-02-01
申请号:US18265897
申请日:2021-12-09
Applicant: UNIVERSITEIT ANTWERPEN
Inventor: Adrian Pedrazo Tardajos , Sara Bals
CPC classification number: H01J37/20 , C23C16/26 , C23C16/56 , H01J2237/2001
Abstract: The present disclosure relates to a sample support device for charged particle microscopy and related methods. The device comprises a substrate and a heating and/or biasing element integrated in or on the substrate to heat (or apply a bias voltage to) a sample when positioned in an observation region of the device. The device comprises a membrane covering an opening in the heater element and/or substrate in the observation region of the device. The membrane is perforated to form at least one hole covered by a graphene layer to form a sample support to place a sample of interest thereon for study. A cap covers the membrane such that a chamber is formed in which the sample can be isolated in a controllable gaseous environment.