CHARGED PARTICLE MICROSCOPY MEMS SAMPLE SUPPORT

    公开(公告)号:US20240038483A1

    公开(公告)日:2024-02-01

    申请号:US18265897

    申请日:2021-12-09

    CPC classification number: H01J37/20 C23C16/26 C23C16/56 H01J2237/2001

    Abstract: The present disclosure relates to a sample support device for charged particle microscopy and related methods. The device comprises a substrate and a heating and/or biasing element integrated in or on the substrate to heat (or apply a bias voltage to) a sample when positioned in an observation region of the device. The device comprises a membrane covering an opening in the heater element and/or substrate in the observation region of the device. The membrane is perforated to form at least one hole covered by a graphene layer to form a sample support to place a sample of interest thereon for study. A cap covers the membrane such that a chamber is formed in which the sample can be isolated in a controllable gaseous environment.

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