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公开(公告)号：US11198643B2
公开(公告)日：2021-12-14
申请号：US16270735
申请日：2019-02-08
申请人： UNIVERSITY OF LEEDS
发明人： Gin Jose , Toney Teddy Fernandez , Peter John Grant , Animesh Jha , Sikha Saha , David Paul Steenson
IPC分类号： C03C23/00 , C03C3/04 , A61B1/00 , C23C14/48 , A61B5/1455 , C23C14/28 , C23C14/32 , C23C14/22 , G02B6/12
摘要： The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.
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公开(公告)号：US20190256413A1
公开(公告)日：2019-08-22
申请号：US16270735
申请日：2019-02-08
申请人： UNIVERSITY OF LEEDS
发明人： Gin Jose , Toney Teddy Fernandez , Peter John Grant , Animesh Jha , Sikha Saha , David Paul Steenson
IPC分类号： C03C23/00 , C23C14/48 , A61B5/1455 , C03C3/04
摘要： The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.
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公开(公告)号：US10604445B2
公开(公告)日：2020-03-31
申请号：US14377403
申请日：2013-02-08
申请人： UNIVERSITY OF LEEDS
发明人： Gin Jose , Toney Teddy Fernandez , Peter John Grant , Animesh Jha , Sikha Saha , David Paul Steenson
IPC分类号： C23C14/32 , C03C23/00 , C03C3/04 , C23C14/48 , A61B5/1455 , C23C14/28 , C23C14/22 , G02B6/12
摘要： The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said sub-strate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.
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公开(公告)号：US20150353419A1
公开(公告)日：2015-12-10
申请号：US14377403
申请日：2013-02-08
申请人： UNIVERSITY OF LEEDS
发明人： Gin Jose , Toney Teddy Fernandez , Peter John Grant , Animesh Jha , Sikha Saha , David Paul Steenson
IPC分类号： C03C23/00 , C23C14/48 , A61B5/1455 , C03C3/04
CPC分类号： C03C23/0055 , A61B5/1455 , C03C3/04 , C23C14/48 , G02B2006/12061 , G02B2006/12188 , Y10T428/31 , Y10T428/315
摘要： The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a uniform distribution of the implanted ions at a significantly greater depth than previously possible. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.
摘要翻译： 本发明涉及一种包括离子注入层（例如阳离子）的衬底，其中离子注入层具有比先前可能的更大深度的注入离子的均匀分布。 本发明还包括所述衬底，其中衬底是硅基衬底，例如玻璃。 本发明还包括使用所述材料作为波导和所述材料在测量装置中的用途。
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公开(公告)号：US20200239362A1
公开(公告)日：2020-07-30
申请号：US16822468
申请日：2020-03-18
申请人： UNIVERSITY OF LEEDS
发明人： Gin Jose , Toney Teddy Fernandez , Peter John Grant , Animesh Jha , Sikha Saha , David Paul Steenson
IPC分类号： C03C23/00 , C03C3/04 , C23C14/32 , C23C14/48 , C23C14/22 , A61B5/1455 , C23C14/28 , G02B6/12
摘要： The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.
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公开(公告)号：US20170297958A9
公开(公告)日：2017-10-19
申请号：US14377403
申请日：2013-02-08
申请人： UNIVERSITY OF LEEDS
发明人： Gin Jose , Toney Teddy Fernandez , Peter John Grant , Animesh Jha , Sikha Saha , David Paul Steenson
IPC分类号： C03C23/00 , A61B5/1455 , C03C3/04 , C23C14/48 , G02B6/12
CPC分类号： C03C23/0055 , A61B5/1455 , C03C3/04 , C23C14/48 , G02B2006/12061 , G02B2006/12188 , Y10T428/31 , Y10T428/315
摘要： The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a uniform distribution of the implanted ions at a significantly greater depth than previously possible. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.
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公开(公告)号：US20170152174A9
公开(公告)日：2017-06-01
申请号：US14377403
申请日：2013-02-08
申请人： UNIVERSITY OF LEEDS
发明人： Gin Jose , Toney Teddy Fernandez , Peter John Grant , Animesh Jha , Sikha Saha , David Paul Steenson
IPC分类号： C03C23/00 , C23C14/48 , A61B5/1455 , C03C3/04
CPC分类号： C03C23/0055 , A61B5/1455 , C03C3/04 , C23C14/48 , G02B2006/12061 , G02B2006/12188 , Y10T428/31 , Y10T428/315
摘要： The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a uniform distribution of the implanted ions at a significantly greater depth than previously possible. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.
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