公开(公告)号：US20100195070A1

公开(公告)日：2010-08-05

申请号：US12698242

申请日：2010-02-02

申请人： Ulrich Loering ,  Gerd Reisinger ,  Franz-Josef Stickel ,  Sonja Schneider ,  Johann Trenkler ,  Stefan Kraus ,  Gordon Doering ,  Aksel Goehnermeier

发明人： Ulrich Loering ,  Gerd Reisinger ,  Franz-Josef Stickel ,  Sonja Schneider ,  Johann Trenkler ,  Stefan Kraus ,  Gordon Doering ,  Aksel Goehnermeier

IPC分类号： G03B27/68 ,  G02B9/00 ,  B32B3/00

CPC分类号： G03F7/70983 ,  G03F1/62 ,  G03F7/70308 ,  Y10T428/24612

摘要： A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.

摘要翻译： 公开了一种投影物镜。 投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带 波长λ。 多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线， 以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。 第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。 第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。 光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。

公开(公告)号：US08228483B2

公开(公告)日：2012-07-24

申请号：US12698242

申请日：2010-02-02

申请人： Ulrich Loering ,  Gerd Reisinger ,  Franz-Josef Stickel ,  Sonja Schneider ,  Johann Trenkler ,  Stefan Kraus ,  Gordon Doering ,  Aksel Goehnermeier

发明人： Ulrich Loering ,  Gerd Reisinger ,  Franz-Josef Stickel ,  Sonja Schneider ,  Johann Trenkler ,  Stefan Kraus ,  Gordon Doering ,  Aksel Goehnermeier

IPC分类号： G03B27/68

CPC分类号： G03F7/70983 ,  G03F1/62 ,  G03F7/70308 ,  Y10T428/24612

摘要： A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.

摘要翻译： 公开了一种投影物镜。 投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带 波长λ。 多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线， 以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。 第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。 第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。 光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。