-
1.发明申请公开(公告)号：US20100195070A1
公开(公告)日：2010-08-05
申请号：US12698242
申请日：2010-02-02
申请人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
发明人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
CPC分类号： G03F7/70983 , G03F1/62 , G03F7/70308 , Y10T428/24612
摘要： A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.
摘要翻译： 公开了一种投影物镜。 投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带 波长λ。 多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线， 以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。 第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。 第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。 光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。
-
2.发明授权公开(公告)号：US08228483B2
公开(公告)日：2012-07-24
申请号：US12698242
申请日：2010-02-02
申请人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
发明人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
IPC分类号： G03B27/68
CPC分类号： G03F7/70983 , G03F1/62 , G03F7/70308 , Y10T428/24612
摘要： A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.
摘要翻译： 公开了一种投影物镜。 投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带 波长λ。 多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线， 以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。 第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。 第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。 光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。
-
公开(公告)号：US20080036982A1
公开(公告)日：2008-02-14
申请号：US11547909
申请日：2005-04-11
申请人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
发明人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
CPC分类号： G03F7/70466 , G03F7/2022 , G03F7/70258 , G03F7/70266 , G03F7/706
摘要： 1. Method for patterning a substrate using multiple exposure.2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate.2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this.2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.
摘要翻译： 1.使用多次曝光来图案化衬底的方法。 2.1。 本发明涉及使用可调节光学系统的曝光工艺对衬底进行图案化的方法，多次曝光用于在衬底上产生结构图像。 2.2。 根据本发明，对于多个曝光中的至少一个，通过相应的测量步骤确定光学系统的成像质量，并且根据这一点设置影响成像质量的光学系统的至少一个参数 。 2.3。 使用例如 用于微光刻投影曝光设备中的半导体晶片的图案化。
-
4.发明申请Microlithographic projection exposure apparatus and method for introducing an immersion liquid into an immersion space 审中-公开用于将浸没液引入浸入空间的微光刻投影曝光装置和方法公开(公告)号：US20070132969A1
公开(公告)日：2007-06-14
申请号：US10565612
申请日：2004-07-08
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： The invention relates to a projection exposure system for microlithography, said system comprising an illumination device for generating a projection light, and a projection objective comprising a plurality of optical elements such as lenses (L5) and enabling a reticle that can be arranged in an object plane of the projection objective to be imaged onto a light-sensitive surface (26) that can be arranged in an image plane of the projection objective and is applied to a carrier (30). The inventive system is also provided with an immersion device between an image-side last optical element (L5) of the projection objective and the light-sensitive surface (26), for introducing an immersion liquid (34) into an immersion chamber (50). Said immersion device comprises means (44; 66) which can prevent the appearance of gas bubbles (48) in the immersion liquid (34), affecting the imaging quality, and/or can remove existing gas bubbles (48). Said means can be, for example, an ultrasound source (66) or a degasifier (44).
摘要翻译： 本发明涉及一种用于微光刻的投影曝光系统，所述系统包括用于产生投射光的照明装置，以及包括诸如透镜（L 5）的多个光学元件的投影物镜，并且能够将一个掩模版布置在 将被投影物镜的物体平面成像到能够被布置在投影物镜的像平面中并被施加到载体（30）的光敏表面（26）上。 本发明的系统还在投影物镜的最后一个光学元件（L 5）和光敏表面（26）之间设置浸入装置，用于将浸没液（34）引入到浸没室（50） ）。 所述浸渍装置包括能够防止浸没液体（34）中的气泡（48）出现的装置（44; 66），影响成像质量，和/或可以去除现有的气泡（48）。 所述装置可以是例如超声源（66）或脱气器（44）。
-
5.发明申请Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light 审中-公开投影曝光系统，光束投射系统和光束生成方法公开(公告)号：US20120013878A1
公开(公告)日：2012-01-19
申请号：US13173207
申请日：2011-06-30
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm
摘要翻译： 投影曝光系统的光束传送系统包括激光器，其从空腔中的多个纵向激光模式产生激光束，其中由单个纵向激光模式产生的光具有平均线宽度λlat，其中激光 所述光束在所述光束的各个横向位置处具有对应于横向激光模式的第二线宽度λl1，并且其中当所述光束的整个横截面上的平均时，所述光束的激光具有对应于 多个横向激光模式，并且其中λm<λlat<λb，并且其中设置在所述光束中的光学延迟装置提供光程差Dgr; l，其中0.8·λ0 2（2·＆Dgr;λλ） ; 其中λ0是第一激光束的光的平均波长，＆Dgr;λlat表示第二行宽。
-
6.发明授权Projection exposure system, beam delivery system and method of generating a beam of light 有权投影曝光系统，光束传输系统和产生光束的方法公开(公告)号：US07995280B2
公开(公告)日：2011-08-09
申请号：US11792099
申请日：2005-12-01
IPC分类号： G02B27/14
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm
摘要翻译： 投影曝光系统的光束传送系统包括激光器，其从空腔中的多个纵向激光模式产生激光束，其中由单个纵向激光模式产生的光具有平均线宽度λlat，其中激光 所述光束在所述光束的各个横向位置处具有对应于横向激光模式的第二线宽度λl1，并且其中当所述光束的整个横截面上的平均时，所述光束的激光具有对应于 多个横向激光模式，并且其中λm<λlat<λb，并且其中设置在所述光束中的光学延迟装置提供光程差Dgr; l，其中0.8·λ0 2（2·＆Dgr;λl）<＆Dgr ; 其中λ0是第一激光束的光的平均波长，＆Dgr;λlat表示第二行宽。
-
公开(公告)号：US07233386B2
公开(公告)日：2007-06-19
申请号：US11102835
申请日：2005-04-11
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。
-
公开(公告)号：US07605914B2
公开(公告)日：2009-10-20
申请号：US12348204
申请日：2009-01-02
IPC分类号： G01N21/00
CPC分类号： G03F7/70258 , G03F7/705 , G03F7/706
摘要： An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.
摘要翻译： 光学系统具有至少两个可相对于彼此的空间关系的光学元件。 至少一个光学元件包括多个光学部件。 光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置，使得至少一个光学元件的整体图像缺陷低于 预定的阈值。 提供第二测量装置用于测量光学系统的整体图像缺陷，第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。 第二计算装置计算用于至少两个光学元件的第二目标位置，以便减少整体图像缺陷。
-
公开(公告)号：US20090225308A1
公开(公告)日：2009-09-10
申请号：US12348204
申请日：2009-01-02
IPC分类号： G01N21/958 , G01N21/00
CPC分类号： G03F7/70258 , G03F7/705 , G03F7/706
摘要： An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.
摘要翻译： 光学系统具有至少两个可相对于彼此的空间关系的光学元件。 至少一个光学元件包括多个光学部件。 光学系统包括用于单独测量每个光学部件的图像缺陷的第一测量装置和用于计算多个光学部件的第一目标位置的第一计算装置，使得至少一个光学元件的整体图像缺陷低于 预定的阈值。 提供第二测量装置用于测量光学系统的整体图像缺陷，第二计算装置将所测量的整体图像缺陷表示为正交函数集的基本函数的线性组合。 第二计算装置计算用于至少两个光学元件的第二目标位置，以便减少整体图像缺陷。
-
10.发明申请公开(公告)号：US20080225921A1
公开(公告)日：2008-09-18
申请号：US11792099
申请日：2005-12-01
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm
-
-
-
-
-
-
-
-
-
搜索结果
15 条记录 (耗时 0.027 秒)
