Wafer level packaging method
    1.
    发明授权

    公开(公告)号:US10580823B2

    公开(公告)日:2020-03-03

    申请号:US15586102

    申请日:2017-05-03

    IPC分类号: H01L27/146 H01L23/00

    摘要: A wafer level packaging method includes the following steps. A first wafer is bonded over a second wafer. A first grinding process on the first wafer is performed, to remove an upper chamfered edge of the first wafer and reduce a thickness of the first wafer. A trimming process is performed on the first wafer, to remove a lower chamfered edge of the first wafer to form a trimmed first wafer. A second grinding process is performed on the trimmed first wafer, to reduce a thickness of the trimmed first wafer.

    WAFER LEVEL PACKAGING METHOD
    2.
    发明申请

    公开(公告)号:US20180323227A1

    公开(公告)日:2018-11-08

    申请号:US15586102

    申请日:2017-05-03

    摘要: A wafer level packaging method includes the following steps. A first wafer is bonded over a second wafer. A first grinding process on the first wafer is performed, to remove an upper chamfered edge of the first wafer and reduce a thickness of the first wafer. A trimming process is performed on the first wafer, to remove a lower chamfered edge of the first wafer to form a trimmed first wafer. A second grinding process is performed on the trimmed first wafer, to reduce a thickness of the trimmed first wafer.