公开(公告)号：US20230245872A1

公开(公告)日：2023-08-03

申请号：US18014406

申请日：2021-07-07

Applicant: University of Exeter

Inventor： Gregory Austin Daly ,  Gavin Randal Tabor ,  Jonathan Edward Fieldsend

IPC: H01J37/32 ,  H01L21/67 ,  G05B19/418

CPC classification number: H01J37/32926 ,  H01J37/3299 ,  H01L21/67069 ,  G05B19/41875 ,  G05B2219/32181

Abstract: Broadly speaking, the present techniques provide a method and system for controlling a wafer production process in real-time using a trained machine learning, ML, model. Advantageously, the ML model uses multiple sensed parameters to determine a state of a plasma used in the wafer production process, and this can be used to adjust at least one control parameter of a plasma reactor used in the wafer production process to reduce process variability.