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公开(公告)号：US11550084B2
公开(公告)日：2023-01-10
申请号：US16850966
申请日：2020-04-16
Applicant: University of Washington
Inventor： Alan Zhan , Shane Colburn , Arka Majumdar
Abstract: Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from “low-contrast” materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing.
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公开(公告)号：US20200241182A1
公开(公告)日：2020-07-30
申请号：US16850966
申请日：2020-04-16
Applicant: University of Washington
Inventor： Alan Zhan , Shane Colburn , Arka Majumdar
Abstract: Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from “low-contrast” materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing.
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Patent Agency Ranking
公开(公告)号：US20200057182A1
公开(公告)日：2020-02-20
申请号：US16523868
申请日：2019-07-26
Applicant: University of Washington
Inventor： Alan Zhan , Shane Colburn , Arka Majumdar
Abstract: Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from “low-contrast” materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing.
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公开(公告)号：US12061347B2
公开(公告)日：2024-08-13
申请号：US16965899
申请日：2019-01-29
Applicant: University of Washington
Inventor： Shane Colburn , Alan Zhan , Arka Majumdar
CPC classification number: G02B3/0056 , G02B27/0075 , G02B27/4211 , H04N9/03 , H04N23/67
Abstract: Metasurfaces and systems including metasurfaces for imaging and methods of imaging are described. Such metasurfaces may be formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active over a wavelength range and in certain embodiments are configured to form lenses. In particular, the metasurfaces described herein may be configured to focus light passed through the metasurface in an extended depth of focus. Accordingly, the disclosed metasurfaces are generally suitable for generating color without or with minimal chromatic aberrations, for example, in conjunction with computational reconstruction.
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公开(公告)号：US20210037219A1
公开(公告)日：2021-02-04
申请号：US16965899
申请日：2019-01-29
Applicant: University of Washington
Inventor： Shane Colburn , Alan Zhan , Arka Majumdar
Abstract: Metasurfaces and systems including metasurfaces for imaging and methods of imaging are described. Such metasurfaces may be formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active over a wavelength range and in certain embodiments are configured to form lenses. In particular, the metasufaces described herein may be configured to focus light passed through the metasurface in an extended depth of focus. Accordingly, the disclosed metasurfaces are generally suitable for generating color without or with minimal chromatic aberrations, for example, in conjunction with computational reconstruction.
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公开(公告)号：US10670783B2
公开(公告)日：2020-06-02
申请号：US16523868
申请日：2019-07-26
Applicant: University of Washington
Inventor： Alan Zhan , Shane Colburn , Arka Majumdar
Abstract: Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from “low-contrast” materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing.
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公开(公告)号：US10365416B2
公开(公告)日：2019-07-30
申请号：US15758686
申请日：2016-09-08
Applicant: University of Washington
Inventor： Alan Zhan , Shane Colburn , Arka Majumdar
Abstract: Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from “low-contrast” materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing.
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