公开(公告)号：US09662684B2

公开(公告)日：2017-05-30

申请号：US13505385

申请日：2010-03-15

申请人： Uwe Dietze ,  Peter Dress ,  Sherjang Singh

发明人： Uwe Dietze ,  Peter Dress ,  Sherjang Singh

IPC分类号： B08B3/10 ,  B08B7/00 ,  H01L21/67 ,  G03F1/82

CPC分类号： B08B3/10 ,  B08B7/0035 ,  B08B7/0057 ,  G03F1/82 ,  H01L21/67051

摘要： The application describes several methods and an apparatus for treatment of a substrate. In those methods, at least one liquid is applied thereto and electromagnetic radiation is generated in the liquid by means of radiation before applying the liquid to the substrate. Electromagnetic radiation is introduced into the film such that at least a portion of the radiation reaches the substrate surface. In another method for changing the surface characteristics of a substrate having an at least partially hydrophobic substrate surface such that at least a portion of said surface gets a hydrophilic surface characteristic, a liquid is applied to at least the partial area of the surface of the substrate, and UV radiation of a predetermined wavelength is guided onto at least the partial area of the surface of said substrate.

公开(公告)号：US20120211024A1

公开(公告)日：2012-08-23

申请号：US13505385

申请日：2010-03-15

申请人： Uwe Dietze ,  Peter Dress ,  Sherjang Singh

发明人： Uwe Dietze ,  Peter Dress ,  Sherjang Singh

IPC分类号： B08B3/10 ,  B08B7/04 ,  B08B7/00

CPC分类号： B08B3/10 ,  B08B7/0035 ,  B08B7/0057 ,  G03F1/82 ,  H01L21/67051

摘要： The application describes several methods and an apparatus for treatment of at least partial areas of a substrate. In said methods, at least one liquid is applied to at least one partial area of the substrate and electromagnetic radiation is introduced into this liquid, in order to achieve a desired effect in accordance with the respective method. In one method, radicals are generated in the liquid by means of UV radiation prior to application of the liquid, wherein generation of the radicals occurs directly before applying the liquid to the substrate, such that at least a portion of the radicals reaches the substrate. In one method, in which ions are removed from at least partial areas of the surface of a substrate and near surface layers of said substrate, a liquid, which is heated above ambient temperature is applied to the substrate, in order to form a liquid film on at least a partial area of said substrate, wherein electromagnetic radiation is introduced into said liquid film such that at least a portion of the radiation reaches the substrate surface. In another method for changing the surface characteristics of a substrate having an at least partially hydrophobic substrate surface such that at least a portion of said hydrophobic surface gets a hydrophilic surface characteristic, a liquid is applied to at least the partial area of the surface of the substrate, whose surface characteristic is to be changed, and UV radiation of a predetermined range of wavelength is guided through said liquid onto at least the partial area of the surface of said substrate, whose surface characteristic is to be changed. The methods may be performed in a common apparatus in any desired order in series and/or in parallel.

摘要翻译： 本申请描述了用于处理基底的至少部分区域的几种方法和装置。 在所述方法中，至少一种液体被施加到衬底的至少一个部分区域，并且电磁辐射被引入到该液体中，以便根据各自的方法实现期望的效果。 在一种方法中，在施加液体之前通过UV辐射在液体中产生自由基，其中在将液体施加到基底之前直接发生自由基，使得至少一部分自由基到达基底。 在一种方法中，其中从衬底的表面的至少部分区域和所述衬底的表面层的至少部分区域除去离子，将加热到环境温度以上的液体施加到衬底上，以形成液膜 在所述衬底的至少部分区域上，其中电磁辐射被引入所述液膜中，使得至少一部分辐射到达衬底表面。 在用于改变具有至少部分疏水的基底表面的基底的表面特性的另一种方法中，使得所述疏水性表面的至少一部分具有亲水表面特性，将液体施加到至少部分疏水性基底表面的部分区域 基板，其表面特性将被改变，并且预定波长范围的UV辐​​射被引导到所述液体的至少表面特性要改变的表面的部分区域上。 这些方法可以以任何期望的顺序串联和/或并行地在公共设备中执行。