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公开(公告)号：US08613788B2
公开(公告)日：2013-12-24
申请号：US12824398
申请日：2010-06-28
摘要： The addition of 0.5 to 30 ppm boron and 0.5 to 20 ppm calcium to iridium and the Zr- and Hf-free alloys thereof and rhodium and the Zr- and Hf-free alloys thereof surprisingly increases the creep rupture strength at high temperatures, in particular around 1,800° C.
摘要翻译： 加入0.5至30ppm的硼和0.5至20ppm的钙对铱及其不含Zr和Hf的合金和铑以及其不含Zr和Hf的无合金令人惊奇地增加了高温下的蠕变断裂强度，特别是 约1800°C
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公开(公告)号：US20100329922A1
公开(公告)日：2010-12-30
申请号：US12824398
申请日：2010-06-28
摘要： The addition of 0.5 to 30 ppm boron and 0.5 to 20 ppm calcium to iridium and the Zr- and Hf-free alloys thereof and rhodium and the Zr- and Hf-free alloys thereof surprisingly increases the creep rupture strength at high temperatures, in particular around 1,800° C.
摘要翻译： 加入0.5至30ppm的硼和0.5至20ppm的钙对铱及其不含Zr和Hf的合金和铑以及其不含Zr和Hf的无合金令人惊奇地增加了高温下的蠕变断裂强度，特别是 约1800°C
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3.发明授权公开(公告)号：US06756081B2
公开(公告)日：2004-06-29
申请号：US10386231
申请日：2003-03-11
申请人： David Lupton , Ralf Heck , Bernd Stenger , Oliver Warkentin
发明人： David Lupton , Ralf Heck , Bernd Stenger , Oliver Warkentin
IPC分类号： C23C1434
CPC分类号： H01J37/3435 , C23C14/3407 , H01J37/342
摘要： A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.
摘要翻译： 公开了一种具有中空圆柱形溅射材料和靶保持器的阴极溅射单元的中空圆柱形靶。 溅射材料具有环形横截面并且同心地围绕目标保持器的纵向段。 目标支架至少在靶的一端延伸出溅射材料，以允许连接到阴极溅射单元。 从溅射材料延伸的目标夹持器的至少一部分是能够通过至少一个螺钉配件从目标脱离的单个部件。
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公开(公告)号：US20070062810A1
公开(公告)日：2007-03-22
申请号：US11557265
申请日：2006-11-07
申请人： Bernd Gehlert , Heiko Specht , Oliver Warkentin
发明人： Bernd Gehlert , Heiko Specht , Oliver Warkentin
IPC分类号： C23C14/00
CPC分类号： C22C5/06 , Y10T428/31678
摘要： An alloy based on silver is provided, which can be used for reflective layers with a reflection factor of >90% in the visible spectral range of daylight and which exhibits a high resistance to corrosion in sulfur-containing atmospheres. The alloy contains about 0.01 to 5 wt % indium and/or tin and/or antimony and/or bismuth and the remainder silver.
摘要翻译： 提供了一种基于银的合金，其可用于在日光的可见光谱范围内具有> 90％的反射系数的反射层，并且在含硫气氛中表现出高抗腐蚀性。 该合金含有约0.01至5重量％的铟和/或锡和/或锑和/或铋，其余为银。
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5.发明授权公开(公告)号：US06645358B2
公开(公告)日：2003-11-11
申请号：US10047343
申请日：2002-01-15
申请人： David Lupton , Ralf Heck , Bernd Stenger , Oliver Warkentin
发明人： David Lupton , Ralf Heck , Bernd Stenger , Oliver Warkentin
IPC分类号： C23C1434
CPC分类号： H01J37/3435 , C23C14/3407 , H01J37/342
摘要： A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.
摘要翻译： 公开了一种具有中空圆柱形溅射材料和靶保持器的阴极溅射单元的中空圆柱形靶。 溅射材料具有环形横截面并且同心地围绕目标保持器的纵向段。 目标支架至少在靶的一端延伸出溅射材料，以允许连接到阴极溅射单元。 从溅射材料延伸的目标夹持器的至少一部分是能够通过至少一个螺钉配件从目标脱离的单个部件。
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