Beam exposure device
    1.
    发明授权

    公开(公告)号:US09964857B2

    公开(公告)日:2018-05-08

    申请号:US15124701

    申请日:2015-02-26

    摘要: A beam exposure device includes a light-emitting unit for emitting light beams from a plurality of light-emitting positions, a scan unit, an optical condensing system for condensing a spot of the light beams onto a surface to be exposed, and a micro-deflection unit for micro-deflecting the plurality of light beams to expose the space between the beams in the plurality of light beams. The optical condensing system includes a first microlens array arranged between the light-emitting unit and the micro-deflection unit and provided with a plurality of microlenses corresponding to the light-emitting positions; and a second microlens array arranged between the micro-deflection unit and the surface to be exposed and provided with a plurality of microlenses each microlens corresponding to the light-emitting unit.

    BEAM EXPOSURE DEVICE
    2.
    发明申请
    BEAM EXPOSURE DEVICE 有权
    光束曝光装置

    公开(公告)号:US20170017163A1

    公开(公告)日:2017-01-19

    申请号:US15124701

    申请日:2015-02-26

    IPC分类号: G03F7/20

    摘要: A beam exposure device includes a light-emitting unit for emitting light beams from a plurality of light-emitting positions, a scan unit, an optical condensing system for condensing a spot of the light beams onto a surface to be exposed, and a micro-deflection unit for micro-deflecting the plurality of light beams to expose the space between the beams in the plurality of light beams. The optical condensing system includes a first microlens array arranged between the light-emitting unit and the micro-deflection unit and provided with a plurality of microlenses corresponding to the light-emitting positions; and a second microlens array arranged between the micro-deflection unit and the surface to be exposed and provided with a plurality of microlenses each microlens corresponding to the light-emitting unit.

    摘要翻译: 光束曝光装置包括用于发射来自多个发光位置的光束的发光单元,扫描单元,用于将光束的点聚光到待曝光的表面上的光学聚光系统, 偏转单元,用于微量偏转所述多个光束以暴露所述多个光束中的所述光束之间的空间。 光聚光系统包括布置在发光单元和微偏转单元之间的第一微透镜阵列,并且具有对应于发光位置的多个微透镜; 以及第二微透镜阵列,布置在所述微偏转单元和要暴露的表面之间,并且设置有与所述发光单元对应的每个微透镜的多个微透镜。