公开(公告)号：USD748591S1

公开(公告)日：2016-02-02

申请号：US29514586

申请日：2015-01-14

Applicant: Veeco Instruments Inc.

Designer： Sandeep Krishnan ,  Keng Moy ,  Alexander I. Gurary ,  Matthew King ,  Vadim Boguslavskiy ,  Steven Krommenhoek

公开(公告)号：US20170191157A1

公开(公告)日：2017-07-06

申请号：US15464898

申请日：2017-03-21

Applicant: Veeco Instruments Inc.

Inventor： Sandeep Krishnan ,  Keng Moy ,  Alex Gurary ,  Matthew King ,  Vadim Boguslavskiy ,  Steven Krommenhoek

IPC: C23C16/458 ,  H01L21/687 ,  C23C16/46

CPC classification number: C23C16/4584 ,  C23C16/4586 ,  C23C16/46 ,  H01L21/6719 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

Abstract: A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.

公开(公告)号：USD744967S1

公开(公告)日：2015-12-08

申请号：US29499058

申请日：2014-08-11

Applicant: Veeco Instruments Inc.

Designer： Sandeep Krishnan ,  Keng Moy ,  Alexander I. Gurary ,  Matthew King ,  Vadim Boguslavskiy ,  Steven Krommenhoek