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公开(公告)号：US08247326B2
公开(公告)日：2012-08-21
申请号：US12170954
申请日：2008-07-10
IPC分类号： H01L21/302
CPC分类号： G11B5/8404 , C09G1/02 , C09K3/1463
摘要： The invention is directed to a method of chemically-mechanically polishing a surface of a substrate, comprising contacting a surface of a substrate comprising nickel-phosphorous with a chemical-mechanical polishing composition comprising wet-process silica, an agent that oxidizes nickel-phosphorous, and an aminopolycarboxylic acid, wherein the polishing composition has a pH of about 1 to about 5, and abrading at least a portion of the nickel-phosphorous to polish the substrate.
摘要翻译： 本发明涉及一种化学机械抛光基材表面的方法，包括使包含镍 - 磷的基材的表面与包含湿法二氧化硅的化学 - 机械抛光组合物接触，氧化镍 - 磷的试剂， 和一种氨基多羧酸，其中所述抛光组合物具有约1至约5的pH，并且研磨所述镍 - 磷的至少一部分以抛光所述基材。
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公开(公告)号：US20100009537A1
公开(公告)日：2010-01-14
申请号：US12170954
申请日：2008-07-10
IPC分类号： H01L21/461
CPC分类号： G11B5/8404 , C09G1/02 , C09K3/1463
摘要： The invention is directed to a method of chemically-mechanically polishing a a surface of a substrate, comprising contacting a surface of a substrate comprising nickel-phosphorous with a chemical-mechanical polishing composition comprising wet-process silica, an agent that oxidizes nickel-phosphorous, and an aminopolycarboxylic acid, wherein the polishing composition has a pH of about 1 to about 5, and abrading at least a portion of the nickel-phosphorous to polish the substrate.
摘要翻译： 本发明涉及一种对基底表面进行化学机械抛光的方法，包括使包含镍 - 磷的基底的表面与包含湿法二氧化硅的化学机械抛光组合物接触，氧化镍 - 磷的试剂， 和一种氨基多羧酸，其中所述抛光组合物具有约1至约5的pH，并且研磨所述镍 - 磷的至少一部分以抛光所述基材。
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3.发明授权Composition and method for polishing nickel-phosphorous-coated aluminum hard disks 有权用于抛光镍 - 磷涂层铝硬盘的组合物和方法公开(公告)号：US07922926B2
公开(公告)日：2011-04-12
申请号：US11970978
申请日：2008-01-08
IPC分类号： C03C15/00
CPC分类号： C23F3/06 , C09G1/02 , C09K3/1463 , C09K13/00
摘要： The invention provides a chemical-mechanical polishing composition consisting essentially of flumed alumina, alpha alumina, silica, a nonionic surfactant, an additive compound selected from the group consisting of glycine, alanine, iminodiacetic acid, and maleic acid, hydrogen peroxide, and water. The invention further provides a method of chemically-mechanically polishing a substrate comprising contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.
摘要翻译： 本发明提供了一种化学机械抛光组合物，其基本上由熔融氧化铝，α氧化铝，二氧化硅，非离子表面活性剂，选自甘氨酸，丙氨酸，亚氨基二乙酸和马来酸，过氧化氢和水组成的组的组合物组成。 本发明还提供了一种化学机械抛光衬底的方法，包括使衬底与抛光垫和化学机械抛光组合物接触，使抛光垫和抛光组合物相对于衬底移动，并研磨至少一部分 底物抛光底物。
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4.发明申请COMPOSITION AND METHOD FOR POLISHING NICKEL-PHOSPHOROUS-COATED ALUMINUM HARD DISKS 有权用于抛光镍 - 磷光涂层铝硬盘的组合物和方法公开(公告)号：US20090173717A1
公开(公告)日：2009-07-09
申请号：US11970978
申请日：2008-01-08
CPC分类号： C23F3/06 , C09G1/02 , C09K3/1463 , C09K13/00
摘要： The invention provides a chemical-mechanical polishing composition consisting essentially of flumed alumina, alpha alumina, silica, a nonionic surfactant, an additive compound selected from the group consisting of glycine, alanine, iminodiacetic acid, and maleic acid, hydrogen peroxide, and water. The invention further provides a method of chemically-mechanically polishing a substrate comprising contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.
摘要翻译： 本发明提供了一种化学机械抛光组合物，其基本上由熔融氧化铝，α氧化铝，二氧化硅，非离子表面活性剂，选自甘氨酸，丙氨酸，亚氨基二乙酸和马来酸，过氧化氢和水组成的组的组合物组成。 本发明还提供了一种化学机械抛光衬底的方法，包括使衬底与抛光垫和化学机械抛光组合物接触，使抛光垫和抛光组合物相对于衬底移动，并研磨至少一部分 底物抛光底物。
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