公开(公告)号：US06336960B1

公开(公告)日：2002-01-08

申请号：US09507845

申请日：2000-02-22

申请人： Vince L. Marinaro ,  Ted Wakamiya ,  Eric Kent

发明人： Vince L. Marinaro ,  Ted Wakamiya ,  Eric Kent

IPC分类号： B01D1900

CPC分类号： B01D36/001 ,  B01D2201/208

摘要： An air bubble purging system for filters include a venturi valve in the drain line of the filter. The venturi valve is connected to a high pressure source line so that when a high rate of flow is produced in the high pressure source line, a venturi effect is created in the venturi valve to open the venturi valve and produce a vacuum in the drain line so that air bubbles are attracted into the drain line and purged.

摘要翻译： 用于过滤器的气泡吹扫系统包括在过滤器的排水管线中的文丘里阀。 文丘里阀连接到高压源管线，使得当在高压源管线中产生高流量时，在文丘里阀中产生文氏管效应以打开文丘里阀并在排水管线中产生真空 使得气泡被吸入排水管并被清洗。

公开(公告)号：US06368985B1

公开(公告)日：2002-04-09

申请号：US09580078

申请日：2000-05-30

申请人： Ted Wakamiya ,  Vince L. Marinaro ,  Eric R. Kent

发明人： Ted Wakamiya ,  Vince L. Marinaro ,  Eric R. Kent

IPC分类号： H01L2131

CPC分类号： H01L21/67225 ,  G03F7/70525 ,  G03F7/70991

摘要： An apparatus for processing semiconductor wafers includes a single imaging stepper for exposing wafers processed on a first track and a second track. A method for processing semiconductor wafers includes selecting one of a first coater and a second coater for coating a first wafer with a photoresist. The coated wafer is exposed in a single stepper to form an exposed wafer. An operator selects one of a first developer and second developer to develop the exposed wafer.

摘要翻译： 一种用于处理半导体晶片的设备包括用于曝光在第一轨道和第二轨道上处理的晶片的单个成像步进器。 一种用于处理半导体晶片的方法包括选择第一涂布机和第二涂布机中的一个，以用光致抗蚀剂涂覆第一晶片。 涂覆的晶片在单个步进器中暴露以形成暴露的晶片。 操作者选择第一显影剂和第二显影剂中的一个以显影曝光的晶片。

公开(公告)号：US06360959B1

公开(公告)日：2002-03-26

申请号：US09592920

申请日：2000-06-13

申请人： Eric R. Kent ,  Vince L. Marinaro ,  Ted Wakamiya

发明人： Eric R. Kent ,  Vince L. Marinaro ,  Ted Wakamiya

IPC分类号： B05B1700

CPC分类号： B05B1/14 ,  B05B9/002

摘要： A dual tip nozzle replaces a single tip nozzle in a resist applicator station to double the number of photoresists that are available. The resist applicator station is of the type having a nozzle holder block, at least one single tip nozzle attached to the nozzle holder bock, and a first resist line extending through the nozzle holder block and into engagement with the nozzle. The dual tip nozzle includes two cavities having respective orifices. Each cavity receives a separate resist line for dispensing separate photoresists.

摘要翻译： 双尖头喷嘴替代抗蚀剂涂布工位中的单个尖端喷嘴，使可用的光致抗蚀剂数量增加一倍。 抗蚀剂涂布工位是具有喷嘴保持器块的类型，附接到喷嘴保持器块的至少一个单个尖端喷嘴，以及延伸穿过喷嘴保持器块并与喷嘴接合的第一抗蚀剂线。 双头喷嘴包括具有相应孔口的两个空腔。 每个腔容纳单独的抗蚀剂线，用于分配单独的光致抗蚀剂。