FRAGRANCE EMITTER
    1.
    发明申请
    FRAGRANCE EMITTER 有权
    FRAGRANCE发射器

    公开(公告)号:US20120205462A1

    公开(公告)日:2012-08-16

    申请号:US13398819

    申请日:2012-02-16

    IPC分类号: A62C13/62

    摘要: An apparatus for emitting a fragrance includes an enclosure that has at least one inlet and at least one outlet. The at least one outlet has a cross-sectional area smaller than a cross-sectional area of the at least one inlet. The enclosure further includes a Venturi-type nozzle that defines the at least one outlet. The apparatus also includes a fragrance source positioned within the enclosure and an air mover positioned within the enclosure. The air mover is operable to draw fresh air into the enclosure through the at least one inlet and drive the drawn fresh air across the fragrance source to transfer fragrance material from the fragrance source to the fresh air to form an air-fragrance mixture. The Venturi-type nozzle of the enclosure accelerates the air-fragrance mixture through the at least one outlet.

    摘要翻译: 用于发出香味的装置包括具有至少一个入口和至少一个出口的外壳。 所述至少一个出口的横截面积小于所述至少一个入口的横截面面积。 所述外壳还包括限定所述至少一个出口的文丘里型喷嘴。 该装置还包括位于外壳内的香料源和位于外壳内的空气推动器。 空气推动器可操作以通过至少一个入口将新鲜空气吸入外壳,并将抽吸的新鲜空气驱动穿过香料源,以将香料从香料源转移到新鲜空气中以形成空气香料混合物。 外壳的文丘里型喷嘴通过至少一个出口加速空气香料混合物。

    Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer
    3.
    发明授权
    Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer 有权
    用于光致抗蚀剂显影剂的改进的热交换器的半导体晶片制造方法和装置

    公开(公告)号:US06318913B2

    公开(公告)日:2001-11-20

    申请号:US09829912

    申请日:2001-04-11

    IPC分类号: G03D500

    摘要: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

    摘要翻译: 本发明的实施例包括一种新的装置和技术,以实现利用预先存在的集成单个储存器的化学光刻胶显影剂的改进的温度控制。 通过提供改进的温度控制单元和程序来实现这一改进。 温度控制单元优选地包括多个热交换器管道,每个热交换器管道由进口歧管提供,然后经由出口歧管排出。 温度控制单元优选在改进的喷嘴单元内完全延伸。 通过利用改进的温度控制单元,可以发出显影剂的第一和第二体积分配,使得两者可以在相对较短的时间内被分配在温度受控状态的光致抗蚀剂层表面上。

    Systems and methods for controlling gas flow
    4.
    发明授权
    Systems and methods for controlling gas flow 有权
    用于控制气体流量的系统和方法

    公开(公告)号:US07467639B2

    公开(公告)日:2008-12-23

    申请号:US10402513

    申请日:2003-03-28

    IPC分类号: F23N1/00

    摘要: A method for controlling a motion of a gas valve in a gas feed line coupling a supply device to a burner is provided. The method includes receiving a signal representative of a user-selected desired level of heat output of the burner, translating the received signal to a first current signal, measuring a second current signal in a conducting medium that is operatively coupled with the valve, deriving a third current signal from the first and second current signals, and providing the third current signal to the conducting medium to control the motion of the valve.

    摘要翻译: 提供了一种用于控制将供给装置连接到燃烧器的气体供给管线中的气体阀的运动的方法。 该方法包括接收表示用户选择的燃烧器的所需热量输出的信号,将接收到的信号转换为第一电流信号,测量与阀操作耦合的导电介质中的第二电流信号,得到 来自第一和第二电流信号的第三电流信号,并且向导电介质提供第三电流信号以控制阀的运动。

    System and method for purging air bubbles from filters
    5.
    发明授权
    System and method for purging air bubbles from filters 有权
    从过滤器吹扫气泡的系统和方法

    公开(公告)号:US06336960B1

    公开(公告)日:2002-01-08

    申请号:US09507845

    申请日:2000-02-22

    IPC分类号: B01D1900

    CPC分类号: B01D36/001 B01D2201/208

    摘要: An air bubble purging system for filters include a venturi valve in the drain line of the filter. The venturi valve is connected to a high pressure source line so that when a high rate of flow is produced in the high pressure source line, a venturi effect is created in the venturi valve to open the venturi valve and produce a vacuum in the drain line so that air bubbles are attracted into the drain line and purged.

    摘要翻译: 用于过滤器的气泡吹扫系统包括在过滤器的排水管线中的文丘里阀。 文丘里阀连接到高压源管线,使得当在高压源管线中产生高流量时,在文丘里阀中产生文氏管效应以打开文丘里阀并在排水管线中产生真空 使得气泡被吸入排水管并被清洗。

    Method for automatically cleaning resist nozzle
    6.
    发明授权
    Method for automatically cleaning resist nozzle 失效
    自动清洗抗蚀剂喷嘴的方法

    公开(公告)号:US06170494B2

    公开(公告)日:2001-01-09

    申请号:US09510411

    申请日:2000-02-22

    IPC分类号: B08B302

    摘要: A storage apparatus for photoresist dispensing nozzles has solvent inlets positioned directly opposite the nozzles when the nozzles are in their home positions. Photoresist cleaning solvent is introduced through these inlets at periodic intervals and directly applied on the nozzles to keep them clean.

    摘要翻译: 用于光刻胶分配喷嘴的存储装置在喷嘴处于其原始位置时具有与喷嘴直接相对的溶剂入口。 光刻胶清洗溶剂通过这些入口以周期性间隔引入,并直接施加在喷嘴上以保持清洁。

    Method for detecting malfunction in photolithographic fabrication track
    7.
    发明授权
    Method for detecting malfunction in photolithographic fabrication track 失效
    光刻制作轨迹故障检测方法

    公开(公告)号:US6051348A

    公开(公告)日:2000-04-18

    申请号:US375793

    申请日:1999-08-17

    IPC分类号: G03F7/20 G03F9/00

    CPC分类号: G03F7/70591 G03F7/70616

    摘要: A malfunction in a photolithographic fabrication track is detected by applying photoresist to a semiconductor wafer, and exposing the wafer to substantially identical light images in multiple locations using a stepping printer. The light images are defined by an optical reticle and include a plurality of lines or other features that are spaced from each other at approximately the resolution limit of the printer. Developer is applied to the wafer to produce visible images corresponding to the light images. The visible images function as diffraction gratings which reflect light from the wafer. The visible images are inspected optoelectronically or manually. A malfunction is determined to exist if the visible images are not substantially identical.

    摘要翻译: 通过将光致抗蚀剂施加到半导体晶片,并使用步进式打印机将晶片暴露于多个位置的基本相同的光图像来检测光刻制造轨迹中的故障。 光图像由光学掩模版限定,并且包括在打印机的大致分辨率极限处彼此间隔开的多个线或其他特征。 将显影剂应用于晶片以产生对应于光图像的可见图像。 可视图像用作反射来自晶片的光的衍射光栅。 光电或手动检查可见图像。 如果可见图像基本不相同,则确定存在故障。

    Apparatus for automatically cleaning resist nozzle
    9.
    发明授权
    Apparatus for automatically cleaning resist nozzle 有权
    自动清洗抗蚀剂喷嘴的设备

    公开(公告)号:US06418946B1

    公开(公告)日:2002-07-16

    申请号:US09756615

    申请日:2001-01-05

    IPC分类号: B08B302

    摘要: An apparatus for cleaning dried photoresist from a photoresist dispensing nozzle. The tip of the photoresist dispensing nozzle is inserted through an opening in a nozzle base. A catch pan is positioned beneath the nozzle base. A solvent dispensing needle is inserted through an opening in the catch pan to face the photoresist dispensing nozzle tip and sprays solvent onto the photoresist dispensing nozzle tip. The catch pan collects the solvent and dissolved photoresist particles. The catch pan includes a drain for draining the solvent and the dissolved photoresist particles.

    摘要翻译: 一种用于从光刻胶分配喷嘴清洁干燥的光致抗蚀剂的设备。 光刻胶分配喷嘴的尖端通过喷嘴基座中的开口插入。 捕集盘位于喷嘴底部下方。 溶剂分配针通过捕获盘中的开口插入以面对光刻胶分配喷嘴尖端并将溶剂喷射到光致抗蚀剂分配喷嘴尖端上。 捕集阱收集溶剂和溶解的光致抗蚀剂颗粒。 捕集盘包括用于排出溶剂和溶解的光致抗蚀剂颗粒的排水口。