公开(公告)号：US08243259B2

公开(公告)日：2012-08-14

申请号：US12486458

申请日：2009-06-17

申请人： Vitally Prosyentsov ,  Sanjaysingh Lalbahadoersing ,  Sami Musa ,  Hyun-Woo Lee

发明人： Vitally Prosyentsov ,  Sanjaysingh Lalbahadoersing ,  Sami Musa ,  Hyun-Woo Lee

IPC分类号： G01B11/00 ,  G03B27/42 ,  G03B27/54 ,  G03B27/58 ,  G03B27/74

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/7085

摘要： A substrate stage for an immersion type lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate, the substrate stage being constructed to hold the substrate and including at least a sensor for sensing the patterned radiation beam, the sensor including an at least partially transmissive layer having a front side facing the incoming radiation beam and a back side opposite the front side, wherein the back side is provided with at least a sensor mark to be subjected to the radiation beam transmitted through the layer.

摘要翻译： 用于浸入式光刻设备的衬底台被布置成将来自图案形成装置的图案化辐射束投影到衬底上，衬底台被构造成保持衬底并且至少包括用于感测图案化辐射束的传感器，传感器包括 至少部分透射层，其具有面向所述入射辐射束的前侧和与所述前侧相对的后侧，其中，所述后侧设置有至少一个传感器标记，所述传感器标记经受穿过所述层的辐射束。