公开(公告)号：US09201311B2

公开(公告)日：2015-12-01

申请号：US13533082

申请日：2012-06-26

申请人： Willem Marie Julia Marcel Coene ,  Sven Van Haver

发明人： Willem Marie Julia Marcel Coene ,  Sven Van Haver

IPC分类号： G03F7/20 ,  G01B15/04 ,  G01B11/24 ,  G03F1/26 ,  G03F1/34

CPC分类号： G03F7/70633 ,  G01B11/24 ,  G01B15/04 ,  G03F1/26 ,  G03F1/34 ,  G03F7/706

摘要： A method of measuring a phase difference between two regions in an aberration function: Reference structures are produced on a substrate using illumination that minimizes effects of phase aberration. A grating is produced on the substrate using a phase-shift grating reticle to produce, in the exit pupil, a pair of diffracted non-zero orders, while forbidding other diffracted orders and produces interference fringes formed by interference between the pair. The interference contributes to a first grating on the substrate. Overlay error is measured between the grating and the reference structure using diffraction-based or image-based overlay measurements. A phase aberration function for the exit pupil of the lithographic apparatus can then be determined from the measured overlay errors.

摘要翻译： 测量像差功能中的两个区域之间的相位差的方法：使用最小化相位差的影响的照明在基板上产生参考结构。 使用相移光栅掩模板在基板上产生光栅，以在出射光瞳中产生一对衍射的非零阶，同时禁止其它衍射级并产生由该对之间的干涉形成的干涉条纹。 该干涉有助于衬底上的第一光栅。 使用基于衍射或基于图像的覆盖测量，在光栅和参考结构之间测量叠加误差。 然后可以从测量的重叠误差确定光刻设备的出射光瞳的相位差函数。

公开(公告)号：US20130010306A1

公开(公告)日：2013-01-10

申请号：US13533082

申请日：2012-06-26

申请人： Willem Marie Julia Marcel Coene ,  Sven Van Haver

发明人： Willem Marie Julia Marcel Coene ,  Sven Van Haver

IPC分类号： G01B11/14

CPC分类号： G03F7/70633 ,  G01B11/24 ,  G01B15/04 ,  G03F1/26 ,  G03F1/34 ,  G03F7/706

摘要： A method of measuring a phase difference between two regions in an aberration function: Reference structures are produced on a substrate using illumination that minimizes effects of phase aberration. A grating is produced on the substrate using a phase-shift grating reticle to produce, in the exit pupil, a pair of diffracted non-zero orders, while forbidding other diffracted orders and produces interference fringes formed by interference between the pair. The interference contributes to a first grating on the substrate. Overlay error is measured between the grating and the reference structure using diffraction-based or image-based overlay measurements. A phase aberration function for the exit pupil of the lithographic apparatus can then be determined from the measured overlay errors.

摘要翻译： 测量像差功能中的两个区域之间的相位差的方法：使用最小化相位差的影响的照明在基板上产生参考结构。 使用相移光栅掩模板在基板上产生光栅，以在出射光瞳中产生一对衍射的非零阶，同时禁止其它衍射级并产生由该对之间的干涉形成的干涉条纹。 该干涉有助于衬底上的第一光栅。 使用基于衍射或基于图像的覆盖测量，在光栅和参考结构之间测量叠加误差。 然后可以从测量的重叠误差确定光刻设备的出射光瞳的相位差函数。