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149 条记录 (耗时 0.049 秒)

    Planar patterned transparent contact, devices with planar patterned transparent contacts, and/or methods of making the same
    7.
    发明授权
    Planar patterned transparent contact, devices with planar patterned transparent contacts, and/or methods of making the same 有权
    平面图案化透明触点，具有平面图案化透明触点的装置和/或制造它们的方法

    公开(公告)号：US08747959B2

    公开(公告)日：2014-06-10

    申请号：US13174362

    申请日：2011-06-30

    申请人： Alexey Krasnov ,  Muhammad Imran ,  Willem den Boer

    发明人： Alexey Krasnov ,  Muhammad Imran ,  Willem den Boer

    IPC分类号： C08F2/46 ,  B05D3/00 ,  C23C16/40

    CPC分类号： H01L51/442 ,  C03C17/36 ,  C03C17/3644 ,  C03C17/3655 ,  C03C2218/322 ,  G06F3/044 ,  G06F3/045 ,  G06F2203/04103 ,  H01L31/1884 ,  H01L33/405 ,  H01L51/5215 ,  H01L51/5231 ,  H05B33/22 ,  Y02E10/549 ,  Y02P70/521

    摘要： Certain examples relate to improved methods for making patterned substantially transparent contact films, and contact films made by such methods. In certain cases, the contact films may be patterned and substantially planar. Thus, the contact films may be patterned without intentionally removing any material from the layers and/or film, such as may be required by photolithography. In certain example embodiments, an oxygen exchanging system comprising at least two layers may be deposited on a substrate, and the layers may be selectively exposed to heat and/or energy to facilitate the transfer of oxygen ions or atoms from the layer with a higher enthalpy of formation to a layer with a lower enthalpy of formation. In certain cases, the oxygen transfer may permit the conductivity of selective portions of the film to be changed. This advantageously may result in a planar contact film that is patterned with respect to conductivity and/or resistivity.

    摘要翻译： 某些实例涉及用于制备图案化的基本上透明的接触膜的改进方法以及通过这些方法制备的接触膜。 在某些情况下，接触膜可以被图案化并且基本上是平面的。 因此，可以对接触膜进行图案化，而不用有意地从层和/或膜去除任何材料，例如通过光刻可能需要。 在某些示例性实施例中，包含至少两个层的氧交换系统可以沉积在衬底上，并且这些层可以选择性地暴露于热和/或能量以促进氧离子或原子从层中传递更高的焓 的形成到具有较低的形成焓的层。 在某些情况下，氧转移可以允许改变膜的选择性部分的导电性。 这有利地导致相对于导电性和/或电阻率图案化的平面接触膜。

    Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same
    8.
    发明授权
    Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same 有权
    耐温三层抗反射涂层，包括耐温三层抗反射涂层的涂层制品和/或制造该层的方法

    公开(公告)号：US08693097B2

    公开(公告)日：2014-04-08

    申请号：US12923146

    申请日：2010-09-03

    申请人： David M. Broadway ,  Yiwei Lu ,  Willem den Boer ,  Darrell Golden ,  Paul Patriacca ,  Gregory Scott

    发明人： David M. Broadway ,  Yiwei Lu ,  Willem den Boer ,  Darrell Golden ,  Paul Patriacca ,  Gregory Scott

    IPC分类号： G02B1/11 ,  G02B1/12

    CPC分类号： G02B1/115 ,  C03C17/3435 ,  C03C2217/734

    摘要： A coated article includes a temperable antireflection (AR) coating that utilizes medium and low index (index of refraction “n”) layers having compressive residual stress in the AR coating. In certain example embodiments, the coating may include the following layers from the glass substrate outwardly: silicon oxynitride (SiOxNy) medium index layer/high index layer/low index layer. In certain example embodiments, depending on the chemical and optical properties of the high index layer and the substrate, the medium and low index layers of the AR coating are selected to cause a net compressive residual stress and thus optimize the overall performance of the antireflection coating when the coated article is tempered and/or heat-treated.

    摘要翻译： 涂覆制品包括使用在AR涂层中具有压缩残余应力的中等和低折射率（折射率“n”）层的可回火抗反射（AR）涂层。 在某些示例性实施例中，涂层可以包括从玻璃基板向外的以下层：氮氧化硅（SiO x N y）介质折射率层/高折射率层/低折射率层。 在某些示例性实施方案中，根据高折射率层和基底的化学和光学性质，选择AR涂层的介质和低折射率层以产生净压缩残余应力，从而优化抗反射涂层的整体性能 当涂层制品回火和/或热处理时。