Method of setting a stable melting zone in a semiconductor crystalline
rod during crucible-free zone melting thereof
    1.
    发明授权
    Method of setting a stable melting zone in a semiconductor crystalline rod during crucible-free zone melting thereof 失效
    在无坩埚区熔化期间设置半导体结晶棒中的稳定熔融区的方法

    公开(公告)号:US4436578A

    公开(公告)日:1984-03-13

    申请号:US231028

    申请日:1981-02-03

    摘要: Method of setting a stable melting zone in a semiconductor crystalline rod during crucible-free zone melting thereof, by means of a single-winding induction heating coil having an inner diameter smaller than the diameter of a portion of the rod being fed to the melting zone which includes performing the crucible-free zone melting in an argon atmosphere at an overpressure in vicinity of at least 1.5 ata and maximally 6 ata, and setting the outer melting-zone height at a value of between 15 and 23 mm for a diameter of the recrystallized rod portion within a range of 30 to 50 mm, at a value of between 18 and 26 mm for a diameter of the recrystallized rod portion within a range of 50 to 75 mm and at a limiting value of 32 mm for a rod diameter greater than 75 mm.

    摘要翻译: 在半导体晶体棒的无坩埚区熔化期间通过单个绕组的感应加热线圈设定稳定的熔融区域的方法,所述单绕组感应加热线圈的内径小于供给到熔融区域的棒的一部分的直径 其包括在氩气氛中在至少1.5ata和最大6ata附近的超压下进行无坩埚区熔化,并将外部熔融区高度设定在15和23mm之间,直径为 再结晶棒部分在30至50mm的范围内,对于直径为50至75mm的再结晶棒部分的直径为18至26mm,杆直径较大的极限值为32mm 超过75毫米。