公开(公告)号：US20050055121A1

公开(公告)日：2005-03-10

申请号：US10655850

申请日：2003-09-04

Applicant: Wun Wang

Inventor： Wun Wang

IPC: G05B23/02 ,  G06F19/00

CPC classification number: G05B23/0221

Abstract: This invention relates to a method for yield loss analysis of process steps of semiconductor wafers having a plurality of dies, and more particularly relates to a defect inspection technique to determine a hit ratio, computation of yield impact contributions for the defects, and determination of a kill ratio for a specific type of defect. Yield loss is estimated ultimately upon a choice of a defect density distribution function. A defect calibrated factor and a yield impact calibrated factor are introduced herein.

Abstract translation: 本发明涉及一种具有多个模具的半导体晶片的工艺步骤的屈服损耗分析方法，更具体地说，涉及一种用于确定命中率的缺陷检查技术，缺陷的屈服应力贡献的计算和 杀死比例为特定类型的缺陷。 最终在选择缺陷密度分布函数时估计产量损失。 本文介绍了缺陷校准因子和屈服冲击校准因子。

公开(公告)号：US20060072006A1

公开(公告)日：2006-04-06

申请号：US10958027

申请日：2004-10-05

Applicant: Lin Lin ,  Han Lin ,  Wun Wang

Inventor： Lin Lin ,  Han Lin ,  Wun Wang

IPC: H04N13/04 ,  H04N15/00

CPC classification number: H04N13/31

Abstract: A 3D stereo display method and a device thereof. Two sets of shutters are disposed in a display. The shutters are complementarily interlaced with each other. The opening/closing of the two sets of shutters are controlled by time interval concept. When the display frequency is odd frequency, one set of shutters is activated. When the display frequency is even frequency, the other set of shutters is activated. The two sets of shutters are continuously opened and closed according to the variation of the frequency so that in odd and even frequencies, the left and right eyes can respectively see independent images formed of different subpixels. Therefore, a 3D display effect is presented to bare eyes without reducing resolution.

Abstract translation: 一种3D立体显示方法及其装置。 两组百叶窗设在显示屏上。 百叶窗彼此互补交错。 两组百叶窗的打开/关闭由时间间隔概念控制。 当显示频率为奇数频率时，一组快门被激活。 当显示频率为均匀频率时，另一组快门被激活。 根据频率的变化，两组百叶窗连续地打开和关闭，使得在奇数和偶数频率下，左眼和右眼可以分别看到由不同子像素形成的独立图像。 因此，在不降低分辨率的情况下，将3D显示效果呈现给裸眼。

公开(公告)号：US06947806B2

公开(公告)日：2005-09-20

申请号：US10655850

申请日：2003-09-04

Applicant: Wun Wang

Inventor： Wun Wang

IPC: G05B23/02 ,  G06F19/00

CPC classification number: G05B23/0221

Abstract: This invention relates to a method for yield loss analysis of process steps of semiconductor wafers having a plurality of dies, and more particularly relates to a defect inspection technique to determine a hit ratio, computation of yield impact contributions for the defects, and determination of a kill ratio for a specific type of defect. Yield loss is estimated ultimately upon a choice of a defect density distribution function. A defect calibrated factor and a yield impact calibrated factor are introduced herein.

Abstract translation: 本发明涉及一种具有多个模具的半导体晶片的工艺步骤的屈服损耗分析方法，更具体地说，涉及一种用于确定命中率的缺陷检查技术，缺陷的屈服应力贡献的计算和 杀死比例为特定类型的缺陷。 最终在选择缺陷密度分布函数时估计产量损失。 本文介绍了缺陷校准因子和屈服冲击校准因子。