公开(公告)号：US20030113469A1

公开(公告)日：2003-06-19

申请号：US10020991

申请日：2001-12-19

Applicant: Xerox Corporation

Inventor： Sean X. Pan ,  Mark C. Petropoulos ,  Linnette Perales Rivera ,  Jeremy B. Pinsly ,  Zhilei Wang ,  Mark S. Thomas

IPC: B05D001/18 ,  B32B015/08

CPC classification number: B05D1/18 ,  Y10T428/1352 ,  Y10T428/1355 ,  Y10T428/31678

Abstract: An apparatus including: (a) a substrate including a deposition region and an optional uncoated region, wherein the deposition region includes a level intermediate region disposed between a first end region and a second end region, wherein the first end region includes a first raised surface portion extending above the level intermediate region and extending circumferentially around the first end region in a continuous manner; and (b) a dip coated layer over the entire deposition region.

Abstract translation: 一种装置，包括：（a）包括沉积区域和任选的未涂覆区域的基板，其中所述沉积区域包括设置在第一端区域和第二端区域之间的水平中间区域，其中所述第一端区域包括第一凸起表面 在所述水平中间区域上方延伸并以连续方式围绕所述第一端部区域周向延伸的部分; 和（b）在整个沉积区域上的浸涂层。