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    Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings
    2.
    发明授权
    Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings 有权
    具有环氧化物环的聚合物的抗反射涂层与光衰减化合物和未反应的环氧化物环反应

    公开(公告)号：US06670425B2

    公开(公告)日：2003-12-30

    申请号：US09874783

    申请日：2001-06-05

    申请人： Rama Puligadda ,  James E. Lamb, III ,  Tony D. Flaim ,  Runhui Huang ,  Xie Shao

    发明人： Rama Puligadda ,  James E. Lamb, III ,  Tony D. Flaim ,  Runhui Huang ,  Xie Shao

    IPC分类号： B32B2706

    CPC分类号： G03F7/091 ,  Y10S438/952 ,  Y10T428/31511 ,  Y10T428/31525

    摘要： Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted epoxide groups. In another embodiment, the polymers further comprise recurring monomers comprising epoxide rings reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.

    摘要翻译： 提供抗反射组合物和使用具有低介电常数材料的那些组合物的方法。 在一个实施方案中，组合物包括包含具有未反应的环氧基团的重复单体的聚合物。 在另一个实施方案中，聚合物还包含包含与光衰减化合物反应以便打开环的环氧化物环的重复单体。 组合物可以施加到电介质层，以便在双镶嵌工艺期间最小化或防止反射，同时阻挡当将有机抗反射涂层施加到低介电常数层时通常发生的通孔或光致抗蚀剂中毒。

    Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
    9.
    发明授权
    Thermosetting polyester anti-reflective coatings for multilayer photoresist processes 有权

    公开(公告)号：US6080530A

    公开(公告)日：2000-06-27

    申请号：US328305

    申请日：1999-06-08

    申请人： Xie Shao ,  Colin Hester ,  Tony D. Flaim ,  Terry Lowell Brewer

    发明人： Xie Shao ,  Colin Hester ,  Tony D. Flaim ,  Terry Lowell Brewer

    IPC分类号： G03F7/11 ,  C08G63/54 ,  C09D167/00 ,  G03F7/09 ,  G03F7/26

    CPC分类号： G03F7/091 ,  C09D167/00 ,  Y10S430/109

    摘要： Thermosetting, bottom-applied polymeric anti-reflective coatings exhibiting high optical density, rapid plasma etch rates, high solubility in preferred coating solvents, excellent feature coverage, and improved stability in solution are disclosed. The principal component of these new anti-reflective coatings is a polyester resin produced by the reaction of one or more difunctional aliphatic carboxylic acids with a stoichiometric excess of a di- and/or a trifunctional aliphatic primary alcohol, wherein at least one of the dicarboxylic acids may contain a reactive methylene (--CH.sub.2 --) group. The resulting polyester resin reaction product is further modified by attaching light-absorbing groups to some or all of the reactive methylene groups (if present) and/or hydroxy groups present on the resin. The dye-attached polyester resin is combined with an aminoplast crosslinking agent and acid catalyst in a suitable solvent system to form the final anti-reflective coating.

    Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
    10.
    发明授权
    Thermosetting polyester anti-reflective coatings for multilayer photoresist processes 失效
    用于多层光刻胶工艺的热固聚酯抗反射涂层

    公开(公告)号：US6042990A

    公开(公告)日：2000-03-28

    申请号：US328316

    申请日：1999-06-08

    申请人： Xie Shao ,  Colin Hester ,  Tony D. Flaim ,  Terry Lowell Brewer

    发明人： Xie Shao ,  Colin Hester ,  Tony D. Flaim ,  Terry Lowell Brewer

    IPC分类号： G03F7/11 ,  C08G63/54 ,  C09D167/00 ,  G03F7/09 ,  G03C1/492

    CPC分类号： G03F7/091 ,  C09D167/00 ,  Y10S430/109

    摘要： Thermosetting, bottom-applied polymeric anti-reflective coatings exhibiting high optical density, rapid plasma etch rates, high solubility in preferred coating solvents, excellent feature coverage, and improved stability in solution are disclosed. The principal component of these new anti-reflective coatings is a polyester resin produced by the reaction of one or more difunctional aliphatic carboxylic acids with a stoichiometric excess of a di- and/or a trifunctional aliphatic primary alcohol, wherein at least one of the dicarboxylic acids may contain a reactive methylene (--CH.sub.2 --) group. The resulting polyester resin reaction product is further modified by attaching light-absorbing groups to some or all of the reactive methylene groups (if present) and/or hydroxy groups present on the resin. The dye-attached polyester resin is combined with an aminoplast crosslinking agent and acid catalyst in a suitable solvent system to form the final anti-reflective coating.

    摘要翻译： 公开了具有高光密度，快速等离子蚀刻速率，优选涂层溶剂中的高溶解度，优异的特征覆盖和改进的溶液稳定性的热固性，底涂聚合物抗反射涂层。 这些新的抗反射涂层的主要成分是通过一种或多种二官能脂族羧酸与化学计量过量的二官能和/或三官能脂族伯醇的反应制备的聚酯树脂，其中至少一种二羧酸 酸可以含有反应性亚甲基（-CH 2 - ）基团。 所得到的聚酯树脂反应产物通过将光吸收基团附着在树脂上存在的一些或全部反应性亚甲基（如果存在）和/或羟基上进一步改性。 染料连接的聚酯树脂与氨基塑料交联剂和酸催化剂在合适的溶剂体系中组合以形成最终的抗反射涂层。