公开(公告)号：US06622288B1

公开(公告)日：2003-09-16

申请号：US09823146

申请日：2001-03-29

申请人： Yao-Ting Wang ,  Kent Richardson ,  Shao-Po Wu ,  Christophe Pierrat ,  Michael Sanie

发明人： Yao-Ting Wang ,  Kent Richardson ,  Shao-Po Wu ,  Christophe Pierrat ,  Michael Sanie

IPC分类号： G06F1750

CPC分类号： G03F1/30

摘要： Techniques for forming a design layout with phase-shifted features, such as an integrated circuit layout, include receiving information about a particular phase-shift conflict in a first physical design layout. The information indicates one or more features logically associated with the particular phase-shift conflict. Then the first physical design layout is adjusted based on that information to produce a second design layout. The adjustments rearrange features in a unit of the design layout to collect free space around a selected feature associated with the phase-shift conflict. With these techniques, a unit needing more space for additional shifters can obtain the needed space during the physical design process making the adjustment. The needed space so obtained allows the fabrication design process to avoid or resolve phase conflicts while forming a fabrication layout, such as a mask, for substantiating the design layout in a printed features layer, such as in an actual integrated circuit.

摘要翻译： 用于形成具有诸如集成电路布局的相移特征的设计布局的技术包括在第一物理设计布局中接收关于特定相移冲突的信息。 该信息指示与特定相移冲突逻辑关联的一个或多个特征。 然后根据该信息调整第一个物理设计布局以产生第二个设计布局。 调整重新排列设计布局中的功能，以收集与相移冲突相关的所选功能周围的可用空间。 利用这些技术，在进行调整的物理设计过程中，需要更多空间的单元可以获得额外的移位器的空间。 如此获得的所需空间允许制造设计过程避免或解决相位冲突，同时形成诸如掩模的制造布局，用于证实印刷特征层（例如在实际集成电路中）的设计布局。

公开(公告)号：US07178128B2

公开(公告)日：2007-02-13

申请号：US10272104

申请日：2002-10-15

申请人： Hua-Yu Liu ,  Christophe Pierrat ,  Kent Richardson

发明人： Hua-Yu Liu ,  Christophe Pierrat ,  Kent Richardson

IPC分类号： G06F17/50

CPC分类号： G03F1/30

摘要： Methods and apparatuses for preparing layouts and masks that use phase shifting to enable production of subwavelength features on an integrated circuit in close (optical) proximity to other structures are described. One embodiment selects from several strategies for resolving conflicts between phase shifters used to define features and (optically) proximate structures that are being defined other than by phase shifting. One embodiment adds additional phase shifters to define the conflicting structures. Another embodiment corrects the shape of the phase shifters in proximity to a conflicting structure. Resulting integrated circuits can include a greater number of subwavelength features even in areas that are in close proximity to structures that were not initially identified for production using a phase shifting mask.

摘要翻译： 描述了用于制备使用相移的布局和掩模的方法和装置，以使得能够在紧密（光学）接近其它结构的集成电路上产生亚波长特征。 一个实施例从用于解决用于定义特征的移相器之间的冲突的几种策略中选择（以光学方式）除了通过相移之外定义的邻近结构之间的冲突。 一个实施例增加了附加移相器来定义冲突结构。 另一个实施例校正了相邻结构附近的移相器的形状。 所得到的集成电路可以包括更多数量的亚波长特征，即使在与初始识别用于使用相移掩模生产的结构非常接近的区域中。

公开(公告)号：US06523165B2

公开(公告)日：2003-02-18

申请号：US09905420

申请日：2001-07-13

申请人： Hua-Yu Liu ,  Christophe Pierrat ,  Kent Richardson

发明人： Hua-Yu Liu ,  Christophe Pierrat ,  Kent Richardson

IPC分类号： G06F1750

CPC分类号： G03F1/30

摘要： Methods and apparatuses for preparing layouts and masks that use phase shifting to enable production of subwavelength features on an integrated circuit in close (optical) proximity to other structures are described. One embodiment selects from several strategies for resolving conflicts between phase shifters used to define features and (optically) proximate structures that are being defined other than by phase shifting. One embodiment adds additional phase shifters to define the conflicting structures. Another embodiment optically corrects the shape of the phase shifters in proximity to a conflicting structure. Resulting integrated circuits can include a greater number of subwavelength features even in areas that are in close proximity to structures that were not initially identified for production using a phase shifting mask.

摘要翻译： 描述了用于制备使用相移的布局和掩模的方法和装置，以使得能够在紧密（光学）接近其它结构的集成电路上产生亚波长特征。 一个实施例从用于解决用于定义特征的移相器之间的冲突的几种策略中选择（以光学方式）除了通过相移之外定义的邻近结构之间的冲突。 一个实施例增加了附加移相器来定义冲突结构。 另一实施例在邻近冲突结构的情况下光学校正移相器的形状。 所得到的集成电路可以包括更多数量的亚波长特征，即使在与初始识别用于使用相移掩模生产的结构非常接近的区域中。

公开(公告)号：US20050240523A1

公开(公告)日：2005-10-27

申请号：US10832114

申请日：2004-04-26

申请人： Kent Richardson ,  Susan Richardson ,  Constance Aldrich ,  Kenneth Aldrich

发明人： Kent Richardson ,  Susan Richardson ,  Constance Aldrich ,  Kenneth Aldrich

IPC分类号： G06Q30/00 ,  G06F17/60

CPC分类号： G06Q30/02 ,  G06Q20/102

摘要： A method of remotely filling a prescription for a patient is disclosed which comprises the steps of: (a) receiving a patient's prescription for a drug, medicine, or other treatment (100); (b) performing at least one drug utilization review based on the prescription (102); (c) filling the prescription (104); (d) providing the filled prescription to a local pharmacy (106); and (e) receiving payment for the filled prescription from the patient (108). Thus, the method combines the services and counseling available from a local pharmacy with the convenience and price associated with a mail-order pharmacy.

摘要翻译： 公开了一种远程填充患者处方的方法，其包括以下步骤：（a）接收患者对药物，药物或其他治疗的处方（100）; （b）根据处方进行至少一次药物使用审查（102）; （c）填写处方（104）; （d）向当地药房提供已填写的处方药（106）; 和（e）从患者（108）接收填写的处方的付款。 因此，该方法将来自当地药店的服务和咨询与邮购药店相关的便利和价格相结合。