SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD, AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD, AND DEVICE MANUFACTURING METHOD 有权
    表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法

    公开(公告)号:US20090323036A1

    公开(公告)日:2009-12-31

    申请号:US12466934

    申请日:2009-05-15

    IPC分类号: G03B27/42 G01B11/14 G03B27/32

    摘要: An apparatus is provided with a light-sending optical system which makes first light from a first pattern and second light from a second pattern incident to a predetermined surface to project intermediate images of the first and second patterns onto the predetermined surface respectively; a light-receiving optical system which guides the first and second light reflected on the predetermined surface, to first and second observation surfaces to form observation images of the first and second patterns, respectively; and a detecting section which detects position information of the observation images of the first and second patterns on the first and second observation surfaces respectively and which calculates a surface position of the predetermined surface, based on the position information. The light-sending optical system projects the intermediate image of the second pattern as an inverted image in a predetermined direction relative to the intermediate image of the first pattern.

    摘要翻译: 一种装置设置有发光光学系统,其使来自第一图案的第一光和从入射到预定表面的第二图案的第二光分别将第一和第二图案的中间图像投影到预定表面上; 光接收光学系统,其将在预定表面上反射的第一和第二光引导到第一和第二观察表面,以分别形成第一和第二图案的观察图像; 以及检测部分,其基于所述位置信息分别检测所述第一和第二观察表面上的所述第一和第二图案的观察图像的位置信息,并且计算所述预定表面的表面位置。 发光光学系统相对于第一图案的中间图像将预定方向的第二图案的中间图像投影为反转图像。

    SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD, AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD, AND DEVICE MANUFACTURING METHOD 有权
    表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法

    公开(公告)号:US20090305175A1

    公开(公告)日:2009-12-10

    申请号:US12426651

    申请日:2009-04-20

    IPC分类号: G03F7/20 G01B11/14 G03B27/54

    摘要: A surface position detecting apparatus comprises a light-sending optical system which makes first light from a first pattern and second light from a second pattern incident at different incidence angles to a predetermined surface to project an intermediate image of the first pattern and an intermediate image of the second pattern onto the predetermined surface; a light-receiving optical system which guides the first light and the second light reflected on the predetermined surface, to a first observation surface and to a second observation surface, respectively, to form an observation image of the first pattern on the first observation surface and an observation image of the second pattern on the second observation surface; and a detecting section which detects position information of the observation image of the first pattern on the first observation surface and position information of the observation image of the second pattern on the second observation surface and which calculates a surface position of the predetermined surface, based on the position information of the observation image of the first pattern and the position information of the observation image of the second pattern.

    摘要翻译: 表面位置检测装置包括发光光学系统,其将来自第一图案的第一光和来自以不同入射角入射到预定表面的第二图案的第二光投射到第一图案的中间图像和第二图案的中间图像 第二图案到预定表面上; 分别将第一光和第二光反射到预定表面上的光接收光学系统分别连接到第一观察表面和第二观察表面,以在第一观察表面上形成第一图案的观察图像, 在第二观察面上的第二图案的观察图像; 以及检测部,其基于第一观察面检测第一图案的观察图像的位置信息和第二观察面上的第二图案的观察图像的位置信息,并且基于 第一图案的观察图像的位置信息和第二图案的观察图像的位置信息。

    SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD, AND DEVICE MANUFACTURING METHOD
    3.
    发明申请
    SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD, AND DEVICE MANUFACTURING METHOD 有权
    表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法

    公开(公告)号:US20100062351A1

    公开(公告)日:2010-03-11

    申请号:US12540064

    申请日:2009-08-12

    申请人: Yasuhiro HIDAKA

    发明人: Yasuhiro HIDAKA

    IPC分类号: G03F7/20 G01B11/14 G03B27/42

    CPC分类号: G03F9/7049 G03F9/7026

    摘要: A surface position detecting apparatus according to an aspect of the present invention has a light-sending optical system which makes first light and second light from first and second patterns incident at different incidence angles to a predetermined surface to project an intermediate image of the first pattern and an intermediate image of the second pattern onto the predetermined surface; a light-receiving optical system which guides the first light and the second light reflected by the predetermined surface, to a first observation surface and to a second observation surface, respectively, to form an observation image of the first pattern and an observation image of the second pattern on the first and second observation surfaces; and a detecting section which detects a piece of position information of the observation image of the first pattern and a piece of position information of the observation image of the second pattern and calculates a surface position of the predetermined surface, based on the pieces of position information. The light-sending optical system has a sending-side reflecting section which reflects the second light having passed via sending-side common optical members, an even number of times to make the second light incident at the incidence angle smaller than that of the first light to the predetermined surface.

    摘要翻译: 根据本发明的一个方面的表面位置检测装置具有:发光光学系统,其使得来自第一和第二图案的第一光和第二光线以不同的入射角入射到预定表面,以突出第一图案的中间图像 以及所述第二图案的中间图像到所述预定表面上; 将由所述预定表面反射的所述第一光和所述第二光分别引导到第一观察面和第二观察面的光接收光学系统,以形成所述第一图案的观察图像和所述第一图案的观察图像, 第一和第二观察表面上的第二图案; 以及检测部,其检测所述第一图案的观察图像的位置信息和所述第二图案的观察图像的位置信息,并且基于所述位置信息来计算所述预定表面的表面位置 。 发光光学系统具有发射侧反射部分,其反射经过发射侧公共光学部件的第二光,偶数次,以使第二光入射角小于第一光的入射角 到预定表面。

    SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
    4.
    发明申请
    SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
    表面位置检测装置,曝光装置和装置制造方法

    公开(公告)号:US20090208875A1

    公开(公告)日:2009-08-20

    申请号:US12353228

    申请日:2009-01-13

    申请人: Yasuhiro HIDAKA

    发明人: Yasuhiro HIDAKA

    IPC分类号: G03F7/20 G01B11/02 G03B27/54

    CPC分类号: G03F9/7049 G03F9/7026

    摘要: A surface position detecting apparatus disclosed herein has a light-sending optical system SL to guide light to a detection target surface, a light-receiving optical system to guide the light to a light-receiving surface, a detector arranged on the light-receiving surface, a splitter to split the light guided to the detection target surface W, into measurement light and reference light on a field basis, and a combiner to combine the measurement light traveling via the detection target surface W toward the light-receiving optical system, with the reference light traveling toward the light-receiving optical system without passing via the detection target surface W, on a field basis; and the detector independently detects the reference light and the measurement light on the light-receiving surface.

    摘要翻译: 本文公开的表面位置检测装置具有将光引导到检测对象面的发光光学系统SL,将光导向受光面的受光光学系统,设置在受光面上的检测器 分离器,将被引导到检测对象面W的光分成测量光和基于场的参考光,以及组合器,将经由检测目标表面W行进的测量光朝向光接收光学系统组合, 基准光在不经过检测对象面W的情况下朝向光接收光学系统行进; 并且检测器独立地检测受光表面上的参考光和测量光。