公开(公告)号：US08222617B2

公开(公告)日：2012-07-17

申请号：US12509116

申请日：2009-07-24

申请人： Yasushi Iseki ,  Takeshi Yoshiyuki ,  Hiroyuki Daido ,  Masahiro Ikegami ,  Mamiko Nishiuchi ,  Akira Noda

发明人： Yasushi Iseki ,  Takeshi Yoshiyuki ,  Hiroyuki Daido ,  Masahiro Ikegami ,  Mamiko Nishiuchi ,  Akira Noda

IPC分类号： G21G5/00

CPC分类号： A61N5/1043 ,  A61N2005/1087 ,  A61N2005/1088

摘要： A laser-driven particle beam irradiation apparatus includes: a particle beam generator irradiating a target with pulsed laser light to emit a laser-driven particle ray; a beam converging unit forming a transportation path which guides the emitted laser-driven particle ray to an object and spatially converging the laser-driven particle ray; an energy selector selecting an energy and an energy width of the laser-driven particle ray; an irradiation port causing the laser-driven particle ray to scan the object to adjust an irradiation position in the object; and an irradiation controller controlling operation of the particle beam generator, the beam converging unit, the energy selector and the irradiation port. The beam converging unit generates a magnetic field on a trajectory of the laser-driven particle ray and converging the laser-driven particle ray by the magnetic field, the magnetic field forcing divergence components of the laser-driven particle ray that go away from a center of the trajectory back to the center of the trajectory.

摘要翻译： 激光驱动的粒子束照射装置包括：粒子束发生器，用脉冲激光照射靶，发射激光驱动的粒子射线; 光束会聚单元，其形成将发射的激光驱动的粒子射线引导到物体并将激光驱动的粒子射线空间收敛的输送路径; 选择激光驱动粒子射线的能量和能量的能量选择器; 照射端口，使激光驱动的粒子射线扫描物体以调节物体中的照射位置; 以及照射控制器，其控制粒子束发生器，束会聚单元，能量选择器和照射端口的操作。 光束会聚单元在激光驱动的粒子射线的轨迹上产生磁场并通过磁场会聚激光驱动的粒子射线，迫使离开中心的激光驱动的粒子射线的发散分量的磁场强迫 的轨迹回到轨迹的中心。

公开(公告)号：US20110139997A1

公开(公告)日：2011-06-16

申请号：US12926097

申请日：2010-10-26

申请人： Hironao Sakaki ,  Mamiko Nishiuchi ,  Toshihiko Hori ,  Masayuki Suzuki ,  Yasushi Iseki ,  Takeshi Yoshiyuki

发明人： Hironao Sakaki ,  Mamiko Nishiuchi ,  Toshihiko Hori ,  Masayuki Suzuki ,  Yasushi Iseki ,  Takeshi Yoshiyuki

IPC分类号： H01J1/50

CPC分类号： A61N5/10 ,  A61N2005/1087 ,  A61N2005/1088 ,  A61N2005/1095 ,  G21K1/093

摘要： To obtain high-directivity, stable, and high-intensity ion beam.An ion beam irradiator 10 is constituted by a combination of a laser-driven ion/electron generator 20 and an ion transporter 30 and is configured to guide ion beam with low directivity emitted from the ion/electron generator 20 to the output end while increasing the directivity of the ion beam or focusing the ion beam at the ion transporter 30. In the ion transporter 30, an electron absorber 33 is provided around a beamline 31 at a location on the upstream side in terms of the flow of the ion beam relative to multipole magnets 32. The electron absorber 33 is formed of a material (e.g., polytetrafluoroethylene (PTFE)) that can effectively absorb high-energy electrons. The electron absorber 33 is surrounded by an X-ray shield 34 made of heavy metal such as lead.

摘要翻译： 获得高指向性，稳定和高强度的离子束。 离子束照射器10由激光驱动的离子/电子发生器20和离子运送器30的组合构成，并且被配置为将从离子/电子发生器20发射的低方向性的离子束引导到输出端，同时增加 离子束的方向性或将离子束聚焦在离子传送器30上。在离子传输器30中，在离子束流相对于上游侧的位置处，在束线31周围设置电子吸收体33 多极磁体32.电子吸收体33由能够有效吸收高能电子的材料（例如，聚四氟乙烯（PTFE））形成。 电子吸收体33由铅等重金属构成的X射线屏蔽34包围。

公开(公告)号：US08487282B2

公开(公告)日：2013-07-16

申请号：US13577509

申请日：2011-02-07

申请人： Yasushi Iseki ,  Katsushi Hanawa ,  Kazunao Maeda ,  Nobukazu Kakutani ,  Takuji Furukawa ,  Taku Inaniwa ,  Shinji Sato ,  Kouji Noda

发明人： Yasushi Iseki ,  Katsushi Hanawa ,  Kazunao Maeda ,  Nobukazu Kakutani ,  Takuji Furukawa ,  Taku Inaniwa ,  Shinji Sato ,  Kouji Noda

IPC分类号： A61N5/10

CPC分类号： A61N5/10 ,  A61N5/1043 ,  A61N5/1075 ,  A61N2005/1074 ,  A61N2005/1087 ,  G01T1/2935

摘要： A particle beam irradiation apparatus that can measure and display a dose two-dimensional distribution during scan while reducing degradation of a particle beam shape, including a particle beam generation portion; a particle beam emission control portion; a two-dimensional beam scanning portion; a sensor portion including first linear electrodes arranged in parallel in a first direction and second linear electrodes arranged in parallel in a second direction orthogonal to the first direction; a beam shape calculation portion that calculates a center of gravity of the particle beam from outputs of each the first linear and second linear electrodes and that obtains a two-dimensional beam shape of the particle beam around the center of gravity; a storage portion that accumulates and stores the two-dimensional beam shapes; and a display portion that displays the two-dimensional beam shapes as a two-dimensional distribution of a dose.

摘要翻译： 一种粒子束照射装置，其能够在扫描期间测量并显示剂量二维分布，同时减少包括粒子束产生部分在内的粒子束形状的退化; 粒子束发射控制部分; 二维光束扫描部分; 传感器部分包括沿第一方向平行布置的第一线性电极和沿与第一方向正交的第二方向平行布置的第二线性电极; 束形状计算部，其从所述第一线状电极和所述第二线状电极的输出计算所述粒子束的重心，并且获得所述粒子束围绕所述重心的二维束形状; 存储部，其积存并存储二维光束形状; 以及显示部，其将二维光束形状显示为剂量的二维分布。

公开(公告)号：US08012772B2

公开(公告)日：2011-09-06

申请号：US12343642

申请日：2008-12-24

申请人： Satoshi Koide ,  Yasushi Iseki ,  Akira Ishii

发明人： Satoshi Koide ,  Yasushi Iseki ,  Akira Ishii

IPC分类号： H01L21/00 ,  C23F1/02 ,  H01J9/00 ,  H01J9/44

CPC分类号： H01J9/38 ,  H01J9/42 ,  H01J31/127

摘要： A substrate treating apparatus, in which a voltage is applied to between a treatment electrode and a target substrate in such a state that the treatment electrode is opposed to the target substrate to thereby perform substrate treatment for removing undesired substances on the target substrate, has a reference electrode, a transfer unit which transfers at least one of the treatment electrode and the reference electrode to thereby provide the treatment electrode so that the treatment electrode is opposed to the reference electrode, and a check unit for applying a voltage to between the treatment electrode and the reference electrode in such a state that the treatment electrode is opposed to the reference electrode and thereby checking an adhesion level of undesired substances onto the treatment electrode surface.

摘要翻译： 在处理电极与目标基板相对的状态下，在处理电极和目标基板之间施加电压从而进行用于去除目标基板上的不期望物质的基板处理的基板处理装置具有 参考电极，转移单元，其传送处理电极和参考电极中的至少一个，从而提供处理电极，使得处理电极与参考电极相对;以及检查单元，用于将电压施加到处理电极 和参考电极，使得处理电极与参考电极相对，从而检查不期望的物质在处理电极表面上的粘附程度。

公开(公告)号：US20120305790A1

公开(公告)日：2012-12-06

申请号：US13577741

申请日：2011-02-07

申请人： Katsushi Hanawa ,  Yasushi Iseki ,  Nobukazu Kakutani ,  Takuji Furukawa ,  Taku Inaniwa ,  Shinji Sato ,  Kouji Noda

发明人： Katsushi Hanawa ,  Yasushi Iseki ,  Nobukazu Kakutani ,  Takuji Furukawa ,  Taku Inaniwa ,  Shinji Sato ,  Kouji Noda

IPC分类号： A61N5/10

CPC分类号： A61N5/1043 ,  A61N5/1071 ,  A61N2005/1074 ,  A61N2005/1087 ,  G21K1/025

摘要： Provided is a particle beam irradiation apparatus capable of highly reliable measurement of a dose of each beam and capable of highly sensitive measurement of a leakage dose caused by momentary beam emission. The particle beam irradiation apparatus according to the present invention includes: an emission control portion that controls emission and termination of a particle beam; a control portion that sequentially changes an irradiation position of the particle beam relative to an affected area; first and second dosimeters that measure dose rates of the particle beam directed to the affected area; and an abnormality determination portion that accumulates the dose rates output from the first and second dosimeters for each of predetermined determination periods to calculate first and second sectional dose measurement values and that performs second abnormality determination of determining that there is an abnormality and outputs an interlock signal for terminating the emission of the particle beam in at least one of a case in which the first sectional dose measurement value exceeds a predetermined first reference range and a case in which the second sectional dose measurement value exceeds a predetermined second reference range.

摘要翻译： 提供一种能够高度可靠地测量每个光束的剂量并且能够高度敏感地测量由瞬时光束发射引起的泄漏剂量的粒子束照射装置。 根据本发明的粒子束照射装置包括：发射控制部分，其控制粒子束的发射和终止; 控制部，其依次改变所述粒子束相对于受影响区域的照射位置; 测量指向受影响区域的粒子束的剂量率的第一和第二剂量计; 以及异常判定部，其对于每个规定的判定期间累积从第一和第二剂量计输出的剂量率，以计算第一和第二截面剂量测量值，并且执行确定存在异常的第二异常判定并输出互锁信号 用于在第一部分剂量测量值超过预定的第一参考范围的情况和第二部分剂量测量值超过预定的第二参考范围的情况中的至少一个中终止粒子束的发射。

公开(公告)号：US20090163107A1

公开(公告)日：2009-06-25

申请号：US12343642

申请日：2008-12-24

申请人： Satoshi Koide ,  Yasushi Iseki ,  Akira Ishii

发明人： Satoshi Koide ,  Yasushi Iseki ,  Akira Ishii

IPC分类号： H01J9/00

CPC分类号： H01J9/38 ,  H01J9/42 ,  H01J31/127

摘要： A substrate treating apparatus, in which a voltage is applied to between a treatment electrode and a target substrate in such a state that the treatment electrode is opposed to the target substrate to thereby perform substrate treatment for removing undesired substances on the target substrate, has a reference electrode, a transfer unit which transfers at least one of the treatment electrode and the reference electrode to thereby provide the treatment electrode so that the treatment electrode is opposed to the reference electrode, and a check unit for applying a voltage to between the treatment electrode and the reference electrode in such a state that the treatment electrode is opposed to the reference electrode and thereby checking an adhesion level of undesired substances onto the treatment electrode surface.

摘要翻译： 在处理电极与目标基板相对的状态下，在处理电极和目标基板之间施加电压从而进行用于去除目标基板上的不期望物质的基板处理的基板处理装置具有 参考电极，转移单元，其传送处理电极和参考电极中的至少一个，从而提供处理电极，使得处理电极与参考电极相对;以及检查单元，用于将电压施加到处理电极 和参考电极，使得处理电极与参考电极相对，从而检查不期望的物质在处理电极表面上的粘附程度。

公开(公告)号：US08552408B2

公开(公告)日：2013-10-08

申请号：US13577741

申请日：2011-02-07

申请人： Katsushi Hanawa ,  Yasushi Iseki ,  Nobukazu Kakutani ,  Takuji Furukawa ,  Taku Inaniwa ,  Shinji Sato ,  Kouji Noda

发明人： Katsushi Hanawa ,  Yasushi Iseki ,  Nobukazu Kakutani ,  Takuji Furukawa ,  Taku Inaniwa ,  Shinji Sato ,  Kouji Noda

IPC分类号： A61N5/10

CPC分类号： A61N5/1043 ,  A61N5/1071 ,  A61N2005/1074 ,  A61N2005/1087 ,  G21K1/025

摘要： Provided is a particle beam irradiation apparatus capable of highly reliable measurement of a dose of each beam and capable of highly sensitive measurement of a leakage dose caused by momentary beam emission. The particle beam irradiation apparatus according to the present invention includes: an emission control portion that controls emission and termination of a particle beam; a control portion that sequentially changes an irradiation position of the particle beam relative to an affected area; first and second dosimeters that measure dose rates of the particle beam directed to the affected area; and an abnormality determination portion that accumulates the dose rates output from the first and second dosimeters for each of predetermined determination periods to calculate first and second sectional dose measurement values and that performs second abnormality determination of determining that there is an abnormality and outputs an interlock signal for terminating the emission of the particle beam in at least one of a case in which the first sectional dose measurement value exceeds a predetermined first reference range and a case in which the second sectional dose measurement value exceeds a predetermined second reference range.

摘要翻译： 提供一种能够高度可靠地测量每个光束的剂量并且能够高度敏感地测量由瞬时光束发射引起的泄漏剂量的粒子束照射装置。 根据本发明的粒子束照射装置包括：发射控制部分，其控制粒子束的发射和终止; 控制部，其依次改变所述粒子束相对于受影响区域的照射位置; 测量指向受影响区域的粒子束的剂量率的第一和第二剂量计; 以及异常判定部，其对于每个规定的判定期间累积从第一和第二剂量计输出的剂量率，以计算第一和第二截面剂量测量值，并且执行确定存在异常的第二异常判定并输出互锁信号 用于在第一部分剂量测量值超过预定的第一参考范围的情况和第二部分剂量测量值超过预定的第二参考范围的情况中的至少一个中终止粒子束的发射。

公开(公告)号：US08436323B2

公开(公告)日：2013-05-07

申请号：US12677677

申请日：2008-09-12

申请人： Yasushi Iseki ,  Katsushi Hanawa

发明人： Yasushi Iseki ,  Katsushi Hanawa

IPC分类号： A61N5/10

CPC分类号： A61N5/1049 ,  A61N5/1043 ,  A61N5/1044 ,  A61N5/1064 ,  A61N2005/1087 ,  A61N2005/1095

摘要： A particle beam irradiation apparatus includes: a beam generation unit that generates a particle beam; a beam emission control unit that controls emission of the particle beam; a beam scanning instruction unit that sequentially two-dimensionally instructs a position of the particle beam so that the particle beam is scanned across the entire slice; a beam scanning unit that two-dimensionally scans the particle beam; a respiration gate generation unit that generates a respiration gate synchronized with a respiration cycle of the patient; and a pulse generation unit that generates a predetermined number of scanning start pulses at substantially equally spaced time intervals in the respiration gate. The beam scanning instruction unit instructs to scan the entire slice by pattern irradiation based on a set dose from each of the scanning start pulses so that a scan of the same slice is repeated the predetermined number of times.

摘要翻译： 粒子束照射装置包括：生成粒子束的光束产生部; 光束发射控制单元，其控制所述粒子束的发射; 光束扫描指令单元，其顺序地二维地指示粒子束的位置，使得粒子束跨越整个切片扫描; 二维扫描粒子束的束扫描单元; 呼吸门产生单元，其产生与患者的呼吸循环同步的呼吸门; 以及脉冲产生单元，其在呼吸门中以基本相等间隔的时间间隔产生预定数量的扫描开始脉冲。 光束扫描指示单元指示通过基于来自每个扫描开始脉冲的设定剂量的图案照射来扫描整个切片，使得相同切片的扫描重复预定次数。

公开(公告)号：US20120305796A1

公开(公告)日：2012-12-06

申请号：US13577509

申请日：2011-02-07

申请人： Yasushi Iseki ,  Katsushi Hanawa ,  Kazunao Maeda ,  Nobukazu Kakutani ,  Takuji Furukawa ,  Taku Inaniwa ,  Shinji Sato ,  Kouji Noda

发明人： Yasushi Iseki ,  Katsushi Hanawa ,  Kazunao Maeda ,  Nobukazu Kakutani ,  Takuji Furukawa ,  Taku Inaniwa ,  Shinji Sato ,  Kouji Noda

IPC分类号： A61N5/10 ,  G21K5/04

CPC分类号： A61N5/10 ,  A61N5/1043 ,  A61N5/1075 ,  A61N2005/1074 ,  A61N2005/1087 ,  G01T1/2935

摘要： Provided is a particle beam irradiation apparatus that can measure and display a dose two-dimensional distribution during scan with a simple configuration, while reducing degradation of a particle beam shape. The particle beam irradiation apparatus according to the present invention includes: a beam generation portion that generates a particle beam; a beam emission control portion that controls emission of the particle beam; a beam scanning portion that two-dimensionally scans the particle beam; a sensor portion including a plurality of first linear electrodes arranged in parallel in a first direction and a plurality of second linear electrodes arranged in parallel in a second direction orthogonal to the first direction; a beam shape calculation portion that calculates a center of gravity of the particle beam from a first signal output from each of the first linear electrodes and a second signal output from each of the second linear electrodes and that obtains a two-dimensional beam shape of the particle beam around the center of gravity; a storage portion that accumulates and stores the two-dimensional beam shapes; and a display portion that displays the two-dimensional beam shapes as a two-dimensional distribution of a dose.

摘要翻译： 提供一种粒子束照射装置，其能够以简单的构造在扫描期间测量和显示剂量二维分布，同时减少粒子束形状的劣化。 根据本发明的粒子束照射装置包括：产生粒子束的光束产生部; 控制粒子束发射的光束发射控制部分; 二维地扫描粒子束的光束扫描部; 传感器部分，包括沿第一方向平行布置的多个第一线性电极和沿与第一方向正交的第二方向平行设置的多个第二线性电极; 光束形状计算部分，其根据从每个第一线性电极输出的第一信号和从每个第二线性电极输出的第二信号计算粒子束的重心，并且获得二维波束形状 颗粒束围绕重心; 存储部，其积存并存储二维光束形状; 以及显示部，其将二维光束形状显示为剂量的二维分布。

公开(公告)号：US08334509B2

公开(公告)日：2012-12-18

申请号：US12860432

申请日：2010-08-20

申请人： Yasushi Iseki ,  Masao Takahashi ,  Katsushi Hanawa ,  Kazunao Maeda ,  Atsuo Inoue ,  Teruyasu Nagafuchi ,  Nobukazu Kakutani

发明人： Yasushi Iseki ,  Masao Takahashi ,  Katsushi Hanawa ,  Kazunao Maeda ,  Atsuo Inoue ,  Teruyasu Nagafuchi ,  Nobukazu Kakutani

IPC分类号： G01N23/00

CPC分类号： A61N5/1048 ,  A61N5/1043 ,  A61N2005/1056 ,  A61N2005/1087

摘要： A particle beam irradiation apparatus includes a beam scanning indication unit which two-dimensionally indicates a position of a particle beam in series for each of slices obtained by dividing an affected area to be irradiated in an axial direction of the particle beam, a beam scanning unit which two-dimensionally scans the particle beam based on an indication signal from the beam scanning indication unit, a phosphor film which is provided between the beam scanning unit and a patient and emits light in an amount corresponding to a particle dose of the particle beam transmitting therethrough, an imaging unit which images the phosphor film for each of the slices, and a display unit which obtains an irradiation dose distribution of each of the slices from image data imaged by the imaging unit and displays the obtained irradiation dose distribution associated with a scanning position of the particle beam.

摘要翻译： 粒子束照射装置包括：束扫描指示单元，其对通过将沿粒子束的轴向划分的受影响区域分割得到的每个片段二维地表示粒子束的位置;束扫描单元 其基于来自光束扫描指示单元的指示信号二维地扫描所述粒子束，所述磷光体膜设置在所述光束扫描单元和患者之间，并发射对应于所述粒子束发射的粒子剂量的光 通过其形成用于每个切片的荧光膜的成像单元和从由成像单元成像的图像数据中获得每个切片的照射剂量分布的显示单元，并显示所获得的与扫描相关联的照射剂量分布 粒子束的位置。