公开(公告)号：US07161660B2

公开(公告)日：2007-01-09

申请号：US11017783

申请日：2004-12-22

申请人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

发明人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

IPC分类号： G03B27/72

CPC分类号： G03F7/70558

摘要： A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.

摘要翻译： 公开了一种在曝光过程中的掩模版的管理系统和方法。 计算器计算照射到光刻工艺中使用的掩模版上的照射光的累积剂量。 计算器连接到曝光装置以暴露半导体衬底上的光致抗蚀剂。 比较器将计算的累积剂量与预设的参考剂量进行比较。 当计算的累积剂量大于或等于参考剂量时，控制器暂停光刻工艺。 最小化掩模版上的雾度污染，从而防止过程故障。

公开(公告)号：US20050134823A1

公开(公告)日：2005-06-23

申请号：US11017783

申请日：2004-12-22

申请人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

发明人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

IPC分类号： H01L21/027 ,  G03B27/72 ,  G03F7/20

CPC分类号： G03F7/70558

摘要： A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.

摘要翻译： 公开了一种在曝光过程中的掩模版的管理系统和方法。 计算器计算照射到光刻工艺中使用的掩模版上的照射光的累积剂量。 计算器连接到曝光装置以暴露半导体衬底上的光致抗蚀剂。 比较器将计算的累积剂量与预设的参考剂量进行比较。 当计算的累积剂量大于或等于参考剂量时，控制器暂停光刻工艺。 最小化掩模版上的雾度污染，从而防止过程故障。

公开(公告)号：US06522385B2

公开(公告)日：2003-02-18

申请号：US09848284

申请日：2001-05-04

申请人： Yo-Han Ahn ,  Byung-Moo Lee ,  Hyun-Joon Kim ,  Jai-Heung Choi

发明人： Yo-Han Ahn ,  Byung-Moo Lee ,  Hyun-Joon Kim ,  Jai-Heung Choi

IPC分类号： G03B2752

CPC分类号： G03F7/70908 ,  G03F7/70866 ,  G03F7/70933

摘要： An air shower head of an exposure device of photolithography equipment is free of chemical substances that could otherwise contaminate a photoresist layer on a semiconductor wafer and degrade the profile of the photoresist pattern. The air shower head is interposed between a lens system of the exposure device and a wafer stage, and has a hole in the middle thereof through which exposure light can pass to a wafer supported on the stage. The air shower head includes an upper frame defining a cavity open at the bottom thereof, and a porous bottom member covering the bottom of the upper frame. The porous member is mechanically secured to bottom ends of both the inner and outer side walls of the upper frame, i.e., without the use of chemical binders, to reduce the ability of the air shower head to serve as a source of contamination.

摘要翻译： 光刻设备的曝光装置的空气喷头不含化学物质，否则会污染半导体晶片上的光致抗蚀剂层并降低光致抗蚀剂图案的轮廓。 空气喷头插入在曝光装置的透镜系统和晶片台之间，并且在其中间具有曝光光可以通过其到支撑在平台上的晶片的孔。 空气喷头包括限定在其底部开口的空腔的上框架和覆盖上框架的底部的多孔底部构件。 多孔构件机械地固定到上框架的内侧壁和外侧壁的底端，即不使用化学粘合剂，以降低空气淋浴头作为污染源的能力。

公开(公告)号：US5960642A

公开(公告)日：1999-10-05

申请号：US159769

申请日：1998-09-24

申请人： Kwang-Il Kim ,  Byung-Moo Lee ,  Eui-Joon Kim

发明人： Kwang-Il Kim ,  Byung-Moo Lee ,  Eui-Joon Kim

IPC分类号： F25D11/02 ,  F25B5/00 ,  F25B5/04 ,  F25B40/00 ,  F25B47/02 ,  F25D11/00

CPC分类号： F25B5/04 ,  F25B47/022 ,  F25B2600/2511 ,  F25B40/00 ,  F25D2400/28 ,  F25D2700/02 ,  F25D2700/14

摘要： A refrigerating cycle system for a refrigerator has a freezing chamber and a refrigerating chamber. The refrigerating cycle system includes a compressor, a condenser, first and second expansion devices, a first evaporator for cooling the freezing chamber by evaporating the refrigerant that is reduced in pressure by the first and second expansion devices, and a second evaporator for cooling the refrigerating chamber. A fluid passage is provided for directly conducting the refrigerant from the condenser to the first evaporator. Another fluid passage is provided for directing the refrigerant from the condenser to the first evaporator via the second evaporator. A direction control valve is disposed between those two fluid passages to selectively direct the refrigerant to one of those fluid passages as a function of a sensed temperature of the refrigerating chamber.

摘要翻译： 一种用于冰箱的冷冻循环系统具有冷冻室和冷藏室。 制冷循环系统包括压缩机，冷凝器，第一和第二膨胀装置，第一蒸发器，用于通过蒸发由第一和第二膨胀装置减压的制冷剂来冷却冷冻室;以及第二蒸发器，用于冷却冷藏 房间。 设置有用于将制冷剂从冷凝器直接传导到第一蒸发器的流体通道。 提供另一个流体通道，用于经由第二蒸发器将制冷剂从冷凝器引导到第一蒸发器。 方向控制阀设置在这两个流体通道之间，以根据感测到的冷藏室的温度来选择性地将制冷剂引导到这些流体通道中的一个。