摘要:
Provided is a composition for forming a protective layer which has an excellent acid resistance, an excellent cracking resistance and does not adversely affect semiconductor layers even when acid is used to remove deposits that arise during formation of separation trenches for separating a substrate into device units. Also provided is a method for manufacturing an optical semiconductor device using such a composition. The composition for forming a protective layer includes a siloxane polymer and an organic solvent. The method for manufacturing an optical semiconductor device includes the steps of: forming a protective layer 4 by coating a surface of semiconductor layers 2 and 3 formed on a substrate 1 with a composition for forming a protective layer; forming separation trenches 6 by irradiating the protective layer 4 from above with a laser; and removing deposits that arise during formation of the separation trenches 6.