METHOD FOR MANUFACTURING AN OPTICAL SEMICONDUCTOR DEVICE AND COMPOSITION FOR FORMING A PROTECTIVE LAYER OF AN OPTICAL SEMICONDUCTOR DEVICE
    1.
    发明申请
    METHOD FOR MANUFACTURING AN OPTICAL SEMICONDUCTOR DEVICE AND COMPOSITION FOR FORMING A PROTECTIVE LAYER OF AN OPTICAL SEMICONDUCTOR DEVICE 审中-公开
    用于制造光学半导体器件的方法和用于形成光学半导体器件的保护层的组合物

    公开(公告)号:US20110223744A1

    公开(公告)日:2011-09-15

    申请号:US12892193

    申请日:2010-09-28

    IPC分类号: H01L21/78 C08L83/04

    摘要: Provided is a composition for forming a protective layer which has an excellent acid resistance, an excellent cracking resistance and does not adversely affect semiconductor layers even when acid is used to remove deposits that arise during formation of separation trenches for separating a substrate into device units. Also provided is a method for manufacturing an optical semiconductor device using such a composition. The composition for forming a protective layer includes a siloxane polymer and an organic solvent. The method for manufacturing an optical semiconductor device includes the steps of: forming a protective layer 4 by coating a surface of semiconductor layers 2 and 3 formed on a substrate 1 with a composition for forming a protective layer; forming separation trenches 6 by irradiating the protective layer 4 from above with a laser; and removing deposits that arise during formation of the separation trenches 6.

    摘要翻译: 提供一种用于形成保护层的组合物,其具有优异的耐酸性,优异的耐龟裂性,并且即使使用酸来除去在形成用于将基板分离成装置单元的分离槽期间产生的沉积物也不会不利地影响半导体层。 还提供了使用这种组合物制造光学半导体器件的方法。 用于形成保护层的组合物包括硅氧烷聚合物和有机溶剂。 制造光学半导体器件的方法包括以下步骤:通过用形成保护层的组合物涂覆形成在衬底1上的半导体层2和3的表面来形成保护层4; 通过用激光从上面照射保护层4来形成分离槽6; 并且去除在分离槽6的形成过程中产生的沉积物。