Thin film heat treatment apparatus with conductively heated table and
surrounding radiation shield
    2.
    发明授权
    Thin film heat treatment apparatus with conductively heated table and surrounding radiation shield 失效
    薄膜热处理设备,带导热加热台和周围辐射屏蔽

    公开(公告)号:US5680502A

    公开(公告)日:1997-10-21

    申请号:US362026

    申请日:1995-04-03

    申请人: Yong-Kil Kim

    发明人: Yong-Kil Kim

    CPC分类号: C30B31/12

    摘要: The thin film heat treatment apparatus for heating the wafers or foil sheets provides a conductively heated table disposed within a vacuum chamber, a heat radiation preventing device that is installed adjacent to the conductively heated table and forms a space with the top of the heater table by surrounding the foil sheet or wafer placed on the top of the heater table.

    摘要翻译: 用于加热晶片或箔片的薄膜热处理设备提供设置在真空室内的导热加热台,安装在导热加热台附近的放热防止装置,与加热台顶部形成空间, 围绕放置在加热台顶部的箔片或晶片。