Device, System, And Method For Multidirectional Ultraviolet Lithography
    1.
    发明申请
    Device, System, And Method For Multidirectional Ultraviolet Lithography 审中-公开
    用于多向紫外光刻的装置,系统和方法

    公开(公告)号:US20100195082A1

    公开(公告)日:2010-08-05

    申请号:US12694936

    申请日:2010-01-27

    IPC分类号: G03B27/58 G03F7/20 B65D85/00

    CPC分类号: G03F7/201

    摘要: A system according to an embodiment of the present invention comprises a movable stage having a top surface. A photosensitive material may be deposited on the top surface and a mask may be placed on the photosensitive material. A vessel, having a top portion, one or more flexible sides, and a transparent base, is configured to be placed adjacent to the mask. The base is configured to be movable relative to the top portion of the vessel. In this way, the movable stage, photosensitive material, and mask may move in conjunction with the base of the vessel.

    摘要翻译: 根据本发明的实施例的系统包括具有顶表面的可移动台。 感光材料可以沉积在顶表面上,并且掩模可以放置在感光材料上。 具有顶部,一个或多个柔性侧面和透明基底的容器构造成邻近掩模放置。 基部构造成相对于容器的顶部可移动。 以这种方式,可移动台,感光材料和面罩可以与容器的底部一起移动。