公开(公告)号：US20110263183A1

公开(公告)日：2011-10-27

申请号：US13083833

申请日：2011-04-11

申请人： Yoshiaki KUROSAWA ,  Tomohiro HASHII ,  Yuichi KAKIZONO

发明人： Yoshiaki KUROSAWA ,  Tomohiro HASHII ,  Yuichi KAKIZONO

IPC分类号： B24B57/00 ,  B24B29/02

CPC分类号： B24B37/08 ,  B24B57/02

摘要： The present invention provides a polishing solution distribution apparatus capable of reducing distribution deviation of polishing solution even when leveling for installation is insufficient or inclination of an installation location varies and a polishing apparatus having the same. The polishing solution distribution apparatus includes a cone-shaped branch body in which a solution pan to store supplied polishing solution is formed and in which plural flow passages radially connected to a side face of the solution pan respectively and having a delivery port to supply polishing solution to a position lower than the connected position are formed, a support portion to support the branch body, and a universal joint mechanism to support the branch body via the support portion at a position being higher than the gravity center of the branch body.

摘要翻译： 本发明提供一种能够减少抛光液的分布偏差的抛光液分配装置，即使在安装调平不足或安装位置的倾斜变化的情况下，也能够减少研磨液的分布偏差。 抛光液分配装置包括锥形分支体，其中形成有用于存储供应的抛光溶液的溶液盘，并且其中分别径向地连接到溶液盘的侧面并具有输送口以提供抛光溶液的多个流动通道 形成到比连接位置低的位置，支撑分支体的支撑部和万向接头机构，用于在比分支体的重心高的位置经由支撑部支撑分支体。