公开(公告)号：US09146481B2

公开(公告)日：2015-09-29

申请号：US13171972

申请日：2011-06-29

申请人： Yoshiharu Ota ,  Shigeru Moriyama ,  Yuki Matsumura ,  Shigeki Tanaka

发明人： Yoshiharu Ota ,  Shigeru Moriyama ,  Yuki Matsumura ,  Shigeki Tanaka

IPC分类号： G03B27/42 ,  G03F7/20 ,  H01L27/12

CPC分类号： G03F7/70791 ,  G03F7/70291 ,  H01L27/1288

摘要： A local exposure apparatus for performing exposure processing on a specific area of a photosensitive film formed on a substrate includes a substrate conveyor configured to define a substrate conveying path and to horizontally convey the substrate along the substrate conveying path, a chamber configured to define an exposure processing space, a light source including a plurality of light-emitting elements linearly arranged above the substrate conveying path, a light emission drive unit configured to selectively drive one or more of the light-emitting elements of the light source, a substrate detector configured to detect the substrate conveyed by the substrate conveyor, and a control unit configured to control the light emission drive unit such that, when the specific area of the photosensitive film moves below the light source, only the light-emitting elements capable of irradiating the given area are driven to emit the light.

摘要翻译： 用于对形成在基板上的感光膜的特定区域进行曝光处理的局部曝光装置包括：基板传送器，被配置为限定基板输送路径，并且沿着基板输送路径水平地输送基板;被配置为限定曝光 处理空间，包括线性排列在基板输送路径上方的多个发光元件的光源，被配置为选择性地驱动光源的一个或多个发光元件的发光驱动单元，被配置为 检测由基板输送机输送的基板，以及控制单元，其配置为控制发光驱动单元，使得当感光膜的比表面积在光源下方移动时，仅能够照射给定区域的发光元件 被驱动以发光。