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公开(公告)号：US09146481B2
公开(公告)日：2015-09-29
申请号：US13171972
申请日：2011-06-29
CPC分类号： G03F7/70791 , G03F7/70291 , H01L27/1288
摘要： A local exposure apparatus for performing exposure processing on a specific area of a photosensitive film formed on a substrate includes a substrate conveyor configured to define a substrate conveying path and to horizontally convey the substrate along the substrate conveying path, a chamber configured to define an exposure processing space, a light source including a plurality of light-emitting elements linearly arranged above the substrate conveying path, a light emission drive unit configured to selectively drive one or more of the light-emitting elements of the light source, a substrate detector configured to detect the substrate conveyed by the substrate conveyor, and a control unit configured to control the light emission drive unit such that, when the specific area of the photosensitive film moves below the light source, only the light-emitting elements capable of irradiating the given area are driven to emit the light.
摘要翻译： 用于对形成在基板上的感光膜的特定区域进行曝光处理的局部曝光装置包括：基板传送器，被配置为限定基板输送路径，并且沿着基板输送路径水平地输送基板;被配置为限定曝光 处理空间，包括线性排列在基板输送路径上方的多个发光元件的光源，被配置为选择性地驱动光源的一个或多个发光元件的发光驱动单元，被配置为 检测由基板输送机输送的基板，以及控制单元，其配置为控制发光驱动单元，使得当感光膜的比表面积在光源下方移动时，仅能够照射给定区域的发光元件 被驱动以发光。
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公开(公告)号：US20100163787A1
公开(公告)日：2010-07-01
申请号：US12451932
申请日：2008-06-09
申请人： Rika Tanaka , Haruki Nojo , Yoshiharu Ota
发明人： Rika Tanaka , Haruki Nojo , Yoshiharu Ota
IPC分类号： C09K13/04
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： A polishing composition of the invention is a polishing composition which is suitable for polishing a metal film, which is so-called final polishing, and contains colloidal silica having an average particle size of 20 nm or more and less than 80 nm which is determined by particle size distribution measurement using a light scattering method as abrasive grains; and at least one selected from iodic acid and its salt as an oxidizing agent, with the balance of water. By containing such components, the polishing composition shows non-selectivity, while being sufficiently suppressed in dishing and erosion.
摘要翻译： 本发明的抛光组合物是适用于抛光所谓的最终抛光的金属膜的抛光组合物，并且含有平均粒度为20nm以上且小于80nm的胶体二氧化硅，其由 使用光散射法作为磨粒的粒度分布测量; 和选自碘酸及其盐中的至少一种作为氧化剂，余量为水。 通过含有这些组分，抛光组合物显示非选择性，同时充分抑制凹陷和侵蚀。
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公开(公告)号：US06336054B1
公开(公告)日：2002-01-01
申请号：US09291045
申请日：1999-04-14
申请人： Yoshiharu Ota , Masaaki Yoshida , Shinya Tanoue , Tatsuya Iwasaki
发明人： Yoshiharu Ota , Masaaki Yoshida , Shinya Tanoue , Tatsuya Iwasaki
IPC分类号： G06F1900
CPC分类号： H01L21/67748 , H01L21/67242 , H01L21/67259
摘要： A processing system for processing a substrate. The processing system includes a plurality of processing machines, a machine movable along a transfer path for transferring the substrate to the machines, a drive unit for driving the machine, and a control unit. The control unit includes a memory for storing a teaching threshold in a teaching mode and a practical operation threshold in a practical operation mode that is higher than the teaching threshold when a moving parameter of the drive unit exceeds a given value. The control unit also includes a controller monitoring a parameter representing a moving state of the drive unit to stop the drive unit when the parameter exceeds the practical operation threshold in the practical operation mode or when the parameter exceeds the teaching threshold in the teaching mode.
摘要翻译： 一种用于处理衬底的处理系统。 处理系统包括多个处理机器，沿着用于将基板传送到机器的传送路径移动的机器，用于驱动机器的驱动单元和控制单元。 控制单元包括存储器，用于在实际操作模式中存储教学阈值和实际操作阈值，该实际操作模式当驱动单元的移动参数超过给定值时高于教学阈值。 控制单元还包括控制器，当在实践操作模式中参数超过实际操作阈值时或者当教学模式中参数超过教学阈值时，监控表示驱动单元的移动状态的参数以停止驱动单元。
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公开(公告)号：US6058544A
公开(公告)日：2000-05-09
申请号：US25344
申请日：1998-02-18
申请人： Kimio Motoda , Yoshiharu Ota , Norio Uchihira , Kiyohisa Tateyama
发明人： Kimio Motoda , Yoshiharu Ota , Norio Uchihira , Kiyohisa Tateyama
IPC分类号： G02F1/13 , B08B1/00 , B08B1/04 , B08B3/04 , B08B11/02 , G11B23/50 , H01L21/00 , H01L21/304 , B08B3/10
CPC分类号： H01L21/67051 , B08B1/007 , B08B1/04 , B08B11/02 , H01L21/67046 , G11B23/505
摘要： A scrubbing apparatus comprises a holding member, which holds the outer circumference of the substrate from its back surface and has an opening to expose the back surface of the held substrate toward the bottom side; a supporting member, which supports substantially the center between two opposed sides of the holding member; a scrubbing brush, which comes in contact with the exposed back surface of the substrate from the bottom side; a brush drive mechanism, which transfers the scrubbing brush along the two opposed sides of the holding member; and a rotation drive mechanism, which drives to rotate the holding member together with the supporting member. Thus, a space can be saved, and the back surface of the substrate can be scrubbed.
摘要翻译： 洗涤装置包括保持构件，该保持构件从其后表面保持衬底的外周，并具有用于将保持的衬底的后表面朝向底侧露出的开口; 支撑构件，其基本上支撑在所述保持构件的两个相对侧之间的中心; 洗涤刷，其从底侧与衬底的暴露的背面接触; 刷驱动机构，其沿着保持构件的两个相对侧传送洗刷刷; 以及旋转驱动机构，其驱动以使支撑构件与支撑构件一起旋转。 因此，可以节省空间，并且可以擦洗衬底的背面。
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公开(公告)号：US20120002183A1
公开(公告)日：2012-01-05
申请号：US13171972
申请日：2011-06-29
IPC分类号： G03B27/54
CPC分类号： G03F7/70791 , G03F7/70291 , H01L27/1288
摘要： A local exposure apparatus for performing exposure processing on a specific area of a photosensitive film formed on a substrate includes a substrate conveyor configured to define a substrate conveying path and to horizontally convey the substrate along the substrate conveying path, a chamber configured to define an exposure processing space, a light source including a plurality of light-emitting elements linearly arranged above the substrate conveying path, a light emission drive unit configured to selectively drive one or more of the light-emitting elements of the light source, a substrate detector configured to detect the substrate conveyed by the substrate conveyor, and a control unit configured to control the light emission drive unit such that, when the specific area of the photosensitive film moves below the light source, only the light-emitting elements capable of irradiating the given area are driven to emit the light.
摘要翻译： 用于对形成在基板上的感光膜的特定区域进行曝光处理的局部曝光装置包括：基板传送器，被配置为限定基板输送路径，并且沿着基板输送路径水平地输送基板;被配置为限定曝光 处理空间，包括线性排列在基板输送路径上方的多个发光元件的光源，被配置为选择性地驱动光源的一个或多个发光元件的发光驱动单元，被配置为 检测由基板输送机输送的基板，以及控制单元，其配置为控制发光驱动单元，使得当感光膜的比表面积在光源下方移动时，仅能够照射给定区域的发光元件 被驱动以发光。
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6.发明授权公开(公告)号：US06419575B1
公开(公告)日：2002-07-16
申请号：US09638811
申请日：2000-08-14
申请人： Yoshiharu Ota
发明人： Yoshiharu Ota
IPC分类号： A22C2106
CPC分类号： A22C25/00
摘要： When a salmon ovary is cut, the salmon ovary is held and transferred and in a whole state, the ovary is locally pushed at predetermined gaps, eggs in a membrane are divided into a plurality of clusters by this pushing operation, and the pushed portions of the membrane are then cut.
摘要翻译： 当鲑鱼卵巢被切割时，鲑鱼卵巢被保持和转移，并且在整个状态下，卵巢被局部地按预定间隙推动，通过该推动操作将膜中的卵分成多个簇，并且推动部分 然后切割膜。
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公开(公告)号：US06183810B2
公开(公告)日：2001-02-06
申请号：US09233378
申请日：1999-01-18
申请人： Yoshiharu Ota
发明人： Yoshiharu Ota
IPC分类号： B05D312
CPC分类号： B05D1/005
摘要： Disclosed is a method of forming a coating film, in which a coating solution is supplied from a linear nozzle onto a substrate held by a spin chuck arranged inside a cup having an opening so as to form a coating film on the substrate, comprising the steps of (a) allowing a spin chuck to hold rotatably a substrate, and (b) moving the linear nozzle and supplying a coating solution from the linear nozzle onto the substrate while rotating the substrate in a moving direction of the linear nozzle.
摘要翻译： 公开了一种形成涂膜的方法，其中将涂布溶液从线性喷嘴供给到由布置在具有开口的杯内的旋转卡盘保持的基板上，以在基板上形成涂膜，包括步骤 （a）允许旋转卡盘可旋转地保持基板，以及（b）移动线性喷嘴并将涂布溶液从线性喷嘴供应到基板上，同时沿着线性喷嘴的移动方向旋转基板。
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公开(公告)号：US5963449A
公开(公告)日：1999-10-05
申请号：US904848
申请日：1997-08-01
申请人： Yoshiharu Ota , Masaaki Yoshida , Shinya Tanoue , Tatsuya Iwasaki
发明人： Yoshiharu Ota , Masaaki Yoshida , Shinya Tanoue , Tatsuya Iwasaki
IPC分类号： B65G49/07 , H01L21/00 , H01L21/677 , G06F19/00
CPC分类号： H01L21/67748 , H01L21/67242 , H01L21/67259
摘要： An interlock apparatus for a transfer machine includes a drive unit for driving the arms of a transfer machine for transferring a substrate such as an LCD substrate. The apparatus also includes a control unit having a monitor function for monitoring a parameter representing the movement condition of the arms and stopping the drive unit when the parameter exceed a predetermined value. The apparatus also includes a switching function for selectively switching the predetermined value between a teaching mode in which the position of the arm is controlled and a practical operation mode in which the transfer machine is actually operated.
摘要翻译： 用于转印机的互锁装置包括驱动单元，用于驱动用于转移诸如LCD基板的基板的转印机的臂。 该装置还包括具有监视功能的控制单元，用于监视表示臂的运动状态的参数，并且当参数超过预定值时停止驱动单元。 该装置还包括切换功能，用于在控制臂的位置的教学模式和实际操作转移机器的实际操作模式之间选择性地切换预定值。
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公开(公告)号：US5753298A
公开(公告)日：1998-05-19
申请号：US655420
申请日：1996-05-30
申请人： Yoshiharu Ota
发明人： Yoshiharu Ota
摘要： Salmon or trout ovary is processed into food to make a mouthful of salmon or trout roe. The ovary is taken out of a salmon or trout by incising the salmon or trout abdomen, divided into small ovary pieces of a mouthful size, immersed in saturated salt water, drained to be deprived of salt water, and stored for a prescribed period of time.
摘要翻译： 将三文鱼或鳟鱼卵巢加工成食物以制成一口三文鱼或鳟鱼。 将卵巢从三文鱼或鳟鱼中取出，将鲑鱼或鳟鱼腹部分成小口径的小卵巢片，浸于饱和盐水中，排出盐水，并储存一段规定的时间 。
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10.发明授权
公开(公告)号：US5997920A
公开(公告)日：1999-12-07
申请号：US853079
申请日：1997-05-08
申请人： Yoshiharu Ota
发明人： Yoshiharu Ota
摘要： Salmon or trout ovary is processed into food to make a mouthful of salmon or trout roe. The ovary is taken out of a salmon or trout by incising the salmon or trout abdomen, divided into small ovary pieces of a mouthful size, immersed in saturated salt water, drained to be deprived of salt water, and stored for a prescribed period of time in packing cases having perforated sheet separators.
摘要翻译： 将三文鱼或鳟鱼卵巢加工成食物以制成一口三文鱼或鳟鱼。 将卵巢从三文鱼或鳟鱼中取出，将鲑鱼或鳟鱼腹部分成小口径的小卵巢片，浸于饱和盐水中，排出盐水，并储存一段规定的时间 在具有穿孔板分离器的包装盒中。
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