公开(公告)号：US08223319B2

公开(公告)日：2012-07-17

申请号：US12614666

申请日：2009-11-09

申请人： Yoshihiko Sato ,  Toyoharu Inoue

发明人： Yoshihiko Sato ,  Toyoharu Inoue

IPC分类号： G03B27/58 ,  G03B27/54

CPC分类号： G03F7/70716 ,  G03F9/7011 ,  G03F9/7053 ,  G03F9/7088

摘要： An exposure device is provided. The exposure device includes an alignment stage unit, an exposure processing unit and a workpiece moving mechanism. The alignment stage unit includes: an alignment stage that holds a workpiece having workpiece marks thereon; at least one first alignment microscope that detects the workpiece marks of the workpiece; and a first moving mechanism that relatively moves the alignment stage and the first alignment microscope in an 1-axis direction by a width of the workpiece. The exposure processing unit includes: a mask stage that holds a mask having mask marks thereon; a second alignment microscope that detects the mask marks of the mask; and an exposure stage that holds the workpiece. The workpiece moving mechanism moves the workpiece from the alignment stage unit to the exposure processing unit.

摘要翻译： 提供曝光装置。 曝光装置包括对准台单元，曝光处理单元和工件移动机构。 对准台单元包括：对准台，其保持具有工件标记的工件; 至少一个检测工件的工件标记的第一对准显微镜; 以及第一移动机构，其使所述对准台和所述第一对准显微镜在1轴方向上相对移动所述工件的宽度。 曝光处理单元包括：掩模台，其在其上保持具有掩模标记的掩模; 第二对准显微镜，其检测掩模的掩模标记; 以及保持工件的曝光阶段。 工件移动机构将工件从对准台单元移动到曝光处理单元。

公开(公告)号：US20100118290A1

公开(公告)日：2010-05-13

申请号：US12614666

申请日：2009-11-09

申请人： Yoshihiko SATO ,  Toyoharu Inoue

发明人： Yoshihiko SATO ,  Toyoharu Inoue

IPC分类号： G03B27/58

CPC分类号： G03F7/70716 ,  G03F9/7011 ,  G03F9/7053 ,  G03F9/7088

摘要： An exposure device is provided. The exposure device includes an alignment stage unit, an exposure processing unit and a workpiece moving mechanism. The alignment stage unit includes: an alignment stage that holds a workpiece having workpiece marks thereon; at least one first alignment microscope that detects the workpiece marks of the workpiece; and a first moving mechanism that relatively moves the alignment stage and the first alignment microscope in an 1-axis direction by a width of the workpiece. The exposure processing unit includes: a mask stage that holds a mask having mask marks thereon; a second alignment microscope that detects the mask marks of the mask; and an exposure stage that holds the workpiece. The workpiece moving mechanism moves the workpiece from the alignment stage unit to the exposure processing unit,

摘要翻译： 提供曝光装置。 曝光装置包括对准台单元，曝光处理单元和工件移动机构。 对准台单元包括：对准台，其保持具有工件标记的工件; 至少一个检测工件的工件标记的第一对准显微镜; 以及第一移动机构，其使所述对准台和所述第一对准显微镜在1轴方向上相对移动所述工件的宽度。 曝光处理单元包括：掩模台，其在其上保持具有掩模标记的掩模; 第二对准显微镜，其检测掩模的掩模标记; 以及保持工件的曝光阶段。 工件移动机构将工件从对准台单元移动到曝光处理单元，

公开(公告)号：US07065122B2

公开(公告)日：2006-06-20

申请号：US10369772

申请日：2003-02-21

申请人： Kenji Yamamori ,  Toyoharu Inoue

发明人： Kenji Yamamori ,  Toyoharu Inoue

IPC分类号： H01S3/03 ,  H01S3/97

CPC分类号： H01F27/324 ,  H01F27/2876 ,  H01F27/321

摘要： Electric field easing members (corona rings) for easing concentration of electric fields caused at edges of a core are disposed between the core and a winding to form a gap so to allow the presence of a cooling medium (insulating oil) between the top and bottom surfaces of the core and the electric field easing members. Thus, pressboards between the core and the electric field easing members become unnecessary, a wire-wound apparatus can be prevented from having a short service life due to the degradation of the pressboards, and the pressboards can be made to have a long service life because the electric field easing members are not heated by thermal conduction from the core.

摘要翻译： 用于减轻芯部边缘引起的电场浓度的电场缓和部件（电晕环）设置在芯部和绕组之间以形成间隙，从而允许顶部和底部之间存在冷却介质（绝缘油） 芯部表面和电场缓和部件。 因此，不需要在芯部和电场缓和部件之间的压板，由于压板的劣化，可以防止线绕装置的使用寿命短，并且可以使压板具有较长的使用寿命，因为 电场缓和构件不被来自芯的热传导加热。