公开(公告)号：US20130312460A1

公开(公告)日：2013-11-28

申请号：US13984047

申请日：2011-02-10

申请人： Yosuke Kunishi ,  Hideki Suzuki ,  Rika Matsuo ,  Junichi Ikeno

发明人： Yosuke Kunishi ,  Hideki Suzuki ,  Rika Matsuo ,  Junichi Ikeno

IPC分类号： C30B30/00

CPC分类号： C30B30/00 ,  B23K26/0665 ,  B28D5/0011 ,  C30B29/36 ,  C30B33/04 ,  C30B33/06 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/268 ,  H01L21/304 ,  H01L31/18 ,  H01L31/1848 ,  H01L31/1852 ,  H01L31/1892 ,  Y02E10/544 ,  Y02P70/521

摘要： It is an object of the present invention to provide a manufacturing method of a single crystal substrate and to provide an internal modified layer-forming single crystal member, each of which is capable of easily manufacturing a relatively large and thin single crystal substrate. The manufacturing method of a single crystal substrate includes: the step of arranging a condensing lens (15), which emits laser beams (B) and corrects aberration caused by a refractive index of a single crystal member (10), contactlessly on the single crystal member (10); the step of irradiating the laser beams onto a surface (10t) of the single crystal member (10), and condensing the laser beams into an inside of the single crystal member; the step of moving the condensing lens (15) and the single crystal member (10) relatively to each other, and forming a two-dimensional modified layer (12) in the inside of the single crystal member (10); and the step of exfoliating a single crystal layer, which is formed by being divided by the modified layer (12), from the modified layer (12), thereby forming a single crystal substrate.

摘要翻译： 本发明的目的是提供一种单晶衬底的制造方法，并提供能够容易地制造相对大而薄的单晶衬底的内部改性层形成单晶构件。 单晶衬底的制造方法包括：配置发射激光束（B）的聚光透镜（15）和由单晶构件（10）的折射率引起的像差校正在单晶上的步骤 会员（10）; 将激光束照射到单晶构件（10）的表面（10t）上并将激光束聚光到单晶构件的内部的步骤; 使聚光透镜（15）和单晶构件（10）相对移动的步骤，在单晶构件（10）的内部形成二维改质层（12）。 以及通过被改性层（12）分割形成的单晶层从改性层（12）剥离的步骤，从而形成单晶基板。