Semiconductor device and method of forming gate and metal line thereof with dummy pattern and auxiliary pattern
    2.
    发明授权
    Semiconductor device and method of forming gate and metal line thereof with dummy pattern and auxiliary pattern 失效
    半导体器件及其形成具有虚拟图案和辅助图案的栅极及其金属线的方法

    公开(公告)号:US08053346B2

    公开(公告)日:2011-11-08

    申请号:US12109637

    申请日:2008-04-25

    CPC分类号: H01L27/0207 Y10S438/926

    摘要: A gate in a semiconductor device is formed to have a dummy gate pattern that protects a gate. Metal lines are formed to supply power for a semiconductor device and transfer a signal. A semiconductor device includes a quad coupled receiver type input/output buffer. The semiconductor device is formed with a gate line that extends over an active region, and a gate pad located outside of the active region. The gate line and the gate pad are adjoined such that the gate line and a side of the gate pad form a line. Dummy gates may also be applied. The semiconductor device includes a first metal line patterns supplying power to a block having a plurality of cells, a second metal line pattern transferring a signal to the cells, and dummy metal line patterns divided into in a longitudinal direction.

    摘要翻译: 半导体器件中的栅极形成为具有保护栅极的伪栅极图案。 形成金属线以为半导体器件供电并传输信号。 半导体器件包括四耦合接收器型输入/输出缓冲器。 半导体器件形成有在有源区域上延伸的栅极线和位于有源区域外部的栅极焊盘。 栅极线和栅极焊盘相邻,使得栅极线和栅极焊盘的一侧形成一条线。 也可以应用虚拟门。 半导体器件包括向具有多个单元的块提供功率的第一金属线图案,向单元传输信号的第二金属线图案和沿纵向方向分割的虚拟金属线图案。