利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

4 条记录 (耗时 0.023 秒)

    THIN FILM DEPOSITION APPARATUS
    1.
    发明申请
    THIN FILM DEPOSITION APPARATUS 有权
    薄膜沉积装置

    公开(公告)号：US20110048320A1

    公开(公告)日：2011-03-03

    申请号：US12873689

    申请日：2010-09-01

    申请人： Young-Mook CHOI ,  Chang-Mog Jo ,  Hee-Cheol Kang ,  Hyun-Sook Park

    发明人： Young-Mook CHOI ,  Chang-Mog Jo ,  Hee-Cheol Kang ,  Hyun-Sook Park

    IPC分类号： B05B15/04 ,  B05C5/00

    CPC分类号： C23C16/52 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H01L51/0011 ,  H01L51/56

    摘要： A thin film deposition apparatus that forms a thin film on a substrate includes: a deposition source that discharges a deposition material; a deposition source nozzle unit that is disposed at a side of the deposition source and includes a plurality of deposition source nozzles; a patterning slit sheet that is disposed opposite to the deposition source nozzle unit and includes a plurality of patterning slits; and a blocking member that is disposed between the substrate and the deposition source, wherein the thin film deposition apparatus is separated from the substrate by a predetermined distance, the substrate is moved relative to the thin film deposition apparatus, and the blocking member is moved along with the substrate to screen at least one portion of the substrate.

    摘要翻译： 在衬底上形成薄膜的薄膜沉积装置包括：放电沉积材料的沉积源; 沉积源喷嘴单元，其设置在所述沉积源的一侧并且包括多个沉积源喷嘴; 图案化缝隙片，其与所述沉积源喷嘴单元相对设置并且包括多个图案化缝隙; 以及设置在所述基板和所述沉积源之间的阻挡构件，其中所述薄膜沉积设备与所述基板分离预定距离，所述基板相对于所述薄膜沉积设备移动，并且所述阻挡构件沿着 其中所述衬底筛选所述衬底的至少一部分。

    DEPOSITION SOURCE AND ORGANIC LAYER DEPOSITION APPARATUS INCLUDING THE SAME
    3.
    发明申请
    DEPOSITION SOURCE AND ORGANIC LAYER DEPOSITION APPARATUS INCLUDING THE SAME 审中-公开
    沉积源和有机层沉积装置，包括它们

    公开(公告)号：US20120174865A1

    公开(公告)日：2012-07-12

    申请号：US13328524

    申请日：2011-12-16

    申请人： Young-Mook CHOI ,  Hee-Cheol Kang ,  Chae-Woong Kim ,  Mu-Hyun Kim ,  Dong-Kyu Lee

    发明人： Young-Mook CHOI ,  Hee-Cheol Kang ,  Chae-Woong Kim ,  Mu-Hyun Kim ,  Dong-Kyu Lee

    IPC分类号： C23C16/455 ,  C23C16/04

    CPC分类号： H01L51/0004 ,  C23C14/12 ,  C23C14/243 ,  H01L51/56

    摘要： A deposition source and an organic layer deposition apparatus that may be simply applied to the manufacture of large-sized display apparatuses on a mass scale and may prevent or substantially prevent deposition source nozzles from being blocked during deposition of a deposition material, thereby improving manufacturing yield and deposition efficiency. A deposition source includes a first deposition source including a plurality of first deposition source nozzles, and a second deposition source including a plurality of second deposition source nozzles wherein the plurality of first deposition source nozzles and the plurality of second deposition source nozzles are tilted toward each other.

    摘要翻译： 沉积源和有机层沉积设备可以简单地应用于大规模的大型显示设备的制造，并且可以防止或基本上防止沉积源喷嘴在沉积材料沉积期间被阻挡，从而提高制造产量 和沉积效率。 沉积源包括包括多个第一沉积源喷嘴的第一沉积源和包括多个第二沉积源喷嘴的第二沉积源，其中多个第一沉积源喷嘴和多个第二沉积源喷嘴朝向每个 其他。