摘要:
There may be disclosed a controlling method of a laundry treating apparatus including a low speed rotation step of rotating a motor configured to rotate a drum mounted in a tub at a low speed; and a high speed rotation step of rotating the motor at a high speed, the high speed rotation step implemented after the low speed rotations step, wherein the high speed rotation step comprises an acceleration period in which a RPM of the motor is increased after the RPM of the motor reaches a target RPM of the low speed rotation speed, such that the amount of the additionally supplied wash water may be reduced and that the washing course can be implemented, using a small amount of wash water.
摘要:
A contents sharing server includes an identifier generation unit configured to assign at least one user identifier for each user, a group matching unit configured to match at least one user identifier with at least one of a plurality of groups, each of the plurality of groups having at least one contents identifier for identifying at least one content to be shared within each of the plurality of groups, a request reception unit configured to receive a request including a contents identifier and at least one user identifier, an identifier determination unit configured to search at least one group matched with the at least one user identifier, and determine whether the searched group has the contents identifier and a contents access authority assignment unit configured to assign authority for accessing contents corresponding to the contents identifier.
摘要:
The present invention relates to a laundry treating machine, including an air supply unit for supplying air, a tub for having the air supplied thereto from the air supply unit to treat the laundry, the tub having an air recovery opening formed in an outside circumferential surface thereof for recovery of the air to the air supply unit, a lint filter mounted to an inside of the air recovery opening for filtering the lint from the air, a filter cleaning unit for spraying cleaning water to separate the lint from the lint filter, and a flow passage member for guiding the cleaning water dropping from the lint filter to an inside of the tub to an inside surface of the tub.
摘要:
A laundry treatment apparatus may include a cabinet defining an external appearance of the apparatus, the cabinet having a laundry opening, a laundry accommodation module provided within the cabinet to receive laundry introduced through the laundry opening, a suction duct into which interior air from the laundry accommodation module may be introduced, a discharge duct from which the air is discharged into the laundry accommodation module, a connection duct connecting the suction duct and the discharge duct to each other, a heat exchanger provided in the connection duct, and a blower provided between the heat exchanger and the discharge duct to circulate the interior air of the laundry accommodation module.
摘要:
The present invention relates to a laundry machine having a drying function for drying an object to be dried, especially clothes. In the laundry machine according to one embodiment of the present invention, lint and the like that may be contained in the hot air are removed by the filter, whereby the lint and the like can be prevented from being piled on the duct. Also, the filter is placed in a way that it is exposed into the tub, whereby the filter can be cleaned automatically while it is being driven.
摘要:
The present invention relates to a laundry machine having a drying function for drying an object to be dried, especially clothes. In the laundry machine according to one embodiment of the present invention, lint and the like that may be contained in the hot air are removed by the filter, whereby the lint and the like can be prevented from being piled on the duct. Also, the filter is placed in a way that it is exposed into the tub, whereby the filter can be cleaned automatically while it is being driven.
摘要:
The present invention relates to a laundry machine having a drying function for drying an object to be dried, especially clothes. In the laundry machine according to one embodiment of the present invention, lint and the like that may be contained in the hot air are removed by the filter, whereby the lint and the like can be prevented from being piled on the duct. Also, the filter is placed in a way that it is exposed into the tub, whereby the filter can be cleaned automatically while it is being driven.
摘要:
A clothes treatment apparatus and a method for controlling a clothes treatment apparatus are provided. The method may include feeding heated hot air to clothes or other items received in a drum, and dehydrating the clothes or other items by performing a first rotation cycle for rotating the drum at a first RPM for a predetermined period of time. The first RPM may be a RPM that allows a centrifugal force applied to the clothes or other items during rotation of the drum to exceed gravity.
摘要:
The present invention relates to a laundry machine having a drying function for drying an object to be dried, especially clothes. In the laundry machine according to one embodiment of the present invention, lint and the like that may be contained in the hot air are removed by the filter, whereby the lint and the like can be prevented from being piled on the duct. Also, the filter is placed in a way that it is exposed into the tub, whereby the filter can be cleaned automatically while it is being driven.
摘要:
A semiconductor wafer has a device area where a plurality of semiconductor devices are respectively formed in a plurality of regions partitioned by a plurality of crossing division lines formed on the front side of the semiconductor wafer and a peripheral area surrounding the device area. The back side of the semiconductor wafer corresponding to the device area is ground to thereby form a circular recess and an annular projection surrounding the circular recess. In a chip stacked wafer forming step, a plurality of semiconductor device chips are provided on the bottom surface of the circular recess of the semiconductor wafer at the positions respectively corresponding to the semiconductor devices of the semiconductor wafer. The chip stacked wafer is ground to reduce the thickness of each semiconductor device chip to a finished thickness, and a through electrode is formed in each semiconductor device of the semiconductor wafer.