公开(公告)号：US08932108B2

公开(公告)日：2015-01-13

申请号：US13012934

申请日：2011-01-25

申请人： Yuanfeng Ma ,  Linlang Wu ,  Sheng Zhang

发明人： Yuanfeng Ma ,  Linlang Wu ,  Sheng Zhang

IPC分类号： B24B1/00 ,  B24B31/02 ,  B24B31/023 ,  B24B31/033

CPC分类号： B24B31/033 ,  B24B31/0218 ,  B24B31/023

摘要： A method useful for polishing a large number of miniature components such as multi-layer electronic components, within a high speed barrel polishing device, is disclosed. In various embodiments of the present invention, a vertical planetary ball mill or other barrel polishing device is modified to rotate polishing containers having a modified interior cavity structure. This interior cavity provides a smooth, gradually curved interior sidewall that improves circulation within the container during high-speed vertical polishing rotation. The improved circulation results in polishing for a larger number of components placed within the container and in less time than existing polishing container structures. In further embodiments, the containers are rotated around a generally tilted axis positioned at an angle between entirely vertical and horizontal positions. Rotation about a tilted axis further reduces collisions and increases relative polishing movement within the container.

摘要翻译： 公开了一种用于在高速滚筒抛光装置内抛光大量微型部件如多层电子部件的方法。 在本发明的各种实施例中，对垂直行星式球磨机或其他滚筒抛光装置进行改型以旋转具有改进的内部空腔结构的抛光容器。 该内腔提供平滑，逐渐弯曲的内侧壁，其改善在高速垂直抛光旋转期间容器内的循环。 改善的循环结果导致在容器内放置更多数量的组分并且在比现有抛光容器结构更少的时间内进行抛光。 在另外的实施例中，容器围绕位于完全垂直和水平位置之间的角度的大致倾斜的轴线旋转。 围绕倾斜轴的旋转进一步减少了碰撞并增加了容器内的相对抛光运动。

公开(公告)号：US20110256808A1

公开(公告)日：2011-10-20

申请号：US13012934

申请日：2011-01-25

申请人： Yuanfeng Ma ,  Linlang Wu ,  Sheng Zhang

发明人： Yuanfeng Ma ,  Linlang Wu ,  Sheng Zhang

IPC分类号： B24B31/033 ,  B24B1/00 ,  B24B31/12

CPC分类号： B24B31/033 ,  B24B31/0218 ,  B24B31/023

摘要： A high speed polishing device useful for polishing a large number of miniature components, such as multi-layer electronic components, is disclosed. In various embodiments of the present invention, a vertical planetary ball mill or other barrel polishing device is modified to rotate polishing containers having a modified interior cavity structure. This interior cavity provides a smooth, gradually curved interior sidewall that improves circulation within the container during high-speed vertical polishing rotation. The improved circulation results in polishing for a larger number of components placed within the container and in less time than existing polishing container structures. In further embodiments, the containers are rotated around a generally tilted axis positioned at an angle between entirely vertical and horizontal positions. Rotation about a tilted axis further reduces collisions and increases relative polishing movement within the container.

摘要翻译： 公开了一种用于研磨诸如多层电子部件的大量微型部件的高速抛光装置。 在本发明的各种实施例中，对垂直行星式球磨机或其他滚筒抛光装置进行改型以旋转具有改进的内部空腔结构的抛光容器。 该内腔提供平滑，逐渐弯曲的内侧壁，其改善在高速垂直抛光旋转期间容器内的循环。 改善的循环结果导致在容器内放置更多数量的组分并且在比现有抛光容器结构更少的时间内进行抛光。 在另外的实施例中，容器围绕位于完全垂直和水平位置之间的角度的大致倾斜的轴线旋转。 围绕倾斜轴的旋转进一步减少了碰撞并增加了容器内的相对抛光运动。