Organometallic ruthenium and osmium source reagents for chemical vapor deposition
    1.
    发明授权
    Organometallic ruthenium and osmium source reagents for chemical vapor deposition 失效
    用于化学气相沉积的有机金属钌和锇源试剂

    公开(公告)号:US06303809B1

    公开(公告)日:2001-10-16

    申请号:US09458305

    申请日:1999-12-10

    IPC分类号: C07F1500

    CPC分类号: C07F15/0053 C07F15/0026

    摘要: A series of organometallic complexes of the general formula [M(CO)2L2] was provided, wherein M is ruthenium or osmium metal, and L is a &bgr;-diketonate ligand RC(O)CHC(O)R1 where each of R and R1 is independently selected from the group consisting of atoms of the element, C, H, O and F. These ruthenium and osmium complexes possess enhanced volatility and thermal stability characteristics, and are very suitable for CVD applications. Also disclosed are CVD methods by using these ruthenium or osmium complexes as source reagents for deposition of Ru, Os, RuO2, OsO2, and other Ru- or Os-containing films such as mixed metal oxide materials BaRuO3, SrRuO3, Sr2RuO4 and Bi2Ru2O7 or bimetallic alloys Pt/Ru and Pd/Ru.

    摘要翻译: 提供了一系列具有通式[M(CO)2 L 2]的有机金属络合物,其中M是钌或锇金属,L是β-二酮配体RC(O)CHC(O)R 1,其中R和R 1 独立地选自元素C,H,O和F的原子。这些钌和锇络合物具有增强的挥发性和热稳定性特征,并且非常适用于CVD应用。 还公开了通过使用这些钌或锇络合物作为沉积Ru,Os,RuO 2,OsO 2和其它含Ru或Os的膜,例如混合金属氧化物材料BaRuO 3,SrRuO 3,Sr 2 RuO 4和Bi 2 Ru 2 O 7或双金属 合金Pt / Ru和Pd / Ru。