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公开(公告)号：US20090246648A1
公开(公告)日：2009-10-01
申请号：US12480309
申请日：2009-06-08
IPC分类号： G03F1/00
CPC分类号： G03F1/36
摘要： A photolithography mask includes a design feature located in an isolated or semi-isolated region of the mask and a plurality of parallel linear assist features disposed substantially perpendicular to the design feature. The plurality of parallel linear assist features may include a first series of parallel assist features disposed on a first side of the design feature and perpendicularly thereto, and a second series of parallel assist features disposed on a second side of the design feature and perpendicularly thereto.
摘要翻译： 光刻掩模包括位于掩模的隔离或半隔离区域中的设计特征以及基本垂直于设计特征设置的多个平行线性辅助特征。 多个平行线性辅助特征可以包括设置在设计特征的第一侧并且垂直于其的第一系列平行辅助特征，以及设置在设计特征的第二侧上且垂直于其的第二系列平行辅助特征。
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2.发明申请METHOD OF FORMING AND USING PHOTOLITHOGRAPHY MASK HAVING A SCATTERING BAR STRUCTURE 有权形成和使用具有散射条结构的光刻胶掩模的方法公开(公告)号：US20120040276A1
公开(公告)日：2012-02-16
申请号：US13277920
申请日：2011-10-20
CPC分类号： G03F1/36
摘要： A method of forming a photolithography mask including forming a first linear non-dense feature on the mask and forming a plurality of parallel linear assist features disposed substantially perpendicular to the at least one linear non-dense design feature. In an embodiment, the photolithography mask further includes a first transverse linear assist feature disposed substantially transverse to the plurality of parallel linear assist features.
摘要翻译： 一种形成光刻掩模的方法，包括在掩模上形成第一线性非致密特征并形成基本上垂直于至少一个线性非致密设计特征设置的多个平行线性辅助特征。 在一个实施例中，光刻掩模还包括基本横向于多个平行线性辅助特征设置的第一横向线性辅助特征。
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公开(公告)号：US20070111109A1
公开(公告)日：2007-05-17
申请号：US11273140
申请日：2005-11-14
IPC分类号： G03F1/00
CPC分类号： G03F1/36
摘要： A photolithography mask includes a design feature located in an isolated or semi-isolated region of the mask and a plurality of parallel linear assist features disposed substantially perpendicular to the design feature. The plurality of parallel linear assist features may include a first series of parallel assist features disposed on a first side of the design feature and perpendicularly thereto, and a second series of parallel assist features disposed on a second side of the design feature and perpendicularly thereto
摘要翻译： 光刻掩模包括位于掩模的隔离或半隔离区域中的设计特征以及基本垂直于设计特征设置的多个平行线性辅助特征。 多个平行线性辅助特征可以包括设置在设计特征的第一侧并且垂直于其的第一系列平行辅助特征，以及设置在设计特征的第二侧上且垂直于其的第二系列平行辅助特征
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4.发明授权Method of forming and using photolithography mask having a scattering bar structure 有权具有散射棒结构的光刻掩模的形成和使用方法公开(公告)号：US08677290B2
公开(公告)日：2014-03-18
申请号：US13277920
申请日：2011-10-20
CPC分类号： G03F1/36
摘要： A method of forming a photolithography mask including forming a first linear non-dense feature on the mask and forming a plurality of parallel linear assist features disposed substantially perpendicular to the at least one linear non-dense design feature. In an embodiment, the photolithography mask further includes a first transverse linear assist feature disposed substantially transverse to the plurality of parallel linear assist features.
摘要翻译： 一种形成光刻掩模的方法，包括在掩模上形成第一线性非致密特征并形成基本上垂直于至少一个线性非致密设计特征设置的多个平行线性辅助特征。 在一个实施例中，光刻掩模还包括基本横向于多个平行线性辅助特征设置的第一横向线性辅助特征。
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5.发明授权Photolithography mask having a scattering bar structure that includes transverse linear assist features 有权具有包括横向线性辅助特征的散射棒结构的光刻掩模公开(公告)号：US08048590B2
公开(公告)日：2011-11-01
申请号：US12480309
申请日：2009-06-08
IPC分类号： G03F1/00
CPC分类号： G03F1/36
摘要： A photolithography mask includes a design feature located in an isolated or semi-isolated region of the mask and a plurality of parallel linear assist features disposed substantially perpendicular to the design feature. The plurality of parallel linear assist features may include a first series of parallel assist features disposed on a first side of the design feature and perpendicularly thereto, and a second series of parallel assist features disposed on a second side of the design feature and perpendicularly thereto.
摘要翻译： 光刻掩模包括位于掩模的隔离或半隔离区域中的设计特征以及基本垂直于设计特征设置的多个平行线性辅助特征。 多个平行线性辅助特征可以包括设置在设计特征的第一侧并且垂直于其的第一系列平行辅助特征，以及设置在设计特征的第二侧上且垂直于其的第二系列平行辅助特征。
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6.发明申请Automatic air-blown cleaning device for liquid crystal display component in LCD assembly and method thereof 有权LCD组装液晶显示元件自动吹风清洗装置及其方法公开(公告)号：US20050279383A1
公开(公告)日：2005-12-22
申请号：US11200434
申请日：2005-08-09
申请人： I-Min Chin , Chien-Wen Lai
发明人： I-Min Chin , Chien-Wen Lai
IPC分类号： B08B5/00 , G02F1/13 , G02F1/133 , G02F1/1333
CPC分类号： G02F1/1333 , G02F2001/1316
摘要： An automatic air-blown cleaning apparatus for cleaning a liquid crystal display (LCD) component in an LCD assembly process. The automatic air-blown cleaning apparatus has an assembly station for receiving and assembling the liquid crystal display component, a conveying device for delivering the liquid crystal display component to the next assembly station, and an air filtering blower provided on the conveying device. The air filtering blower sends an air flow toward the liquid crystal display component to remove residual matter from the liquid crystal display component.
摘要翻译： 一种用于在LCD组装过程中清洗液晶显示器（LCD）部件的自动吹风清洁装置。 自动吹风清洁装置具有用于接收和组装液晶显示部件的组装站，用于将液晶显示部件输送到下一个组装站的输送装置和设置在输送装置上的空气过滤鼓风机。 空气过滤鼓风机向液晶显示部件发送空气流以从液晶显示部件除去残留物。
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公开(公告)号：US06489085B2
公开(公告)日：2002-12-03
申请号：US09742960
申请日：2000-12-20
申请人： I-Hsiung Huang , Anderson Chang , Chien-Wen Lai , Anseime Chen
发明人： I-Hsiung Huang , Anderson Chang , Chien-Wen Lai , Anseime Chen
IPC分类号： G03F740
摘要： A thermal flow photolithographic process. A thermal flow photoresist is provided. A cross-linking agent is added to the thermal flow photoresist to form a high-temperature cross-linking photoresist material. A substrate having an insulation layer thereon is provided. The high-temperature cross-linking photoresist is deposited over the insulation layer. The cross-linked photoresist layer on the insulation layer is exposed to light, chemically developed and then heated to cause thermal flow.
摘要翻译： 热流光刻工艺。 提供热流光致抗蚀剂。 将交联剂添加到热流光致抗蚀剂中以形成高温交联光致抗蚀剂材料。 提供其上具有绝缘层的基板。 高温交联光刻胶沉积在绝缘层上。 绝缘层上的交联光致抗蚀剂层暴露于光，化学显影，然后加热以引起热流。
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公开(公告)号：US06617081B2
公开(公告)日：2003-09-09
申请号：US09813048
申请日：2001-03-20
申请人： Chih-Yung Lin , Chien-Wen Lai
发明人： Chih-Yung Lin , Chien-Wen Lai
IPC分类号： G03F900
摘要： In accordance with the present invention, a method is provided for improving process window in semi-dense area by using a phase shifter. This method comprises a step of providing a transparent substrate. Then, at least two opaque regions are formed on the substrate. A phase shifter is formed in the substrate, wherein the phase shifter is formed in-between adjacent opaque regions. As a result, the phase shifter shifts the incident beam at an angle that reduces the proximity effect and improves the optical contrast and the depth of focus (DOF) to get wider process window.
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9.发明授权Automatic air-blown cleaning device for liquid crystal display component in LCD assembly and method thereof 有权LCD组装液晶显示元件自动吹风清洗装置及其方法公开(公告)号：US07311785B2
公开(公告)日：2007-12-25
申请号：US11200434
申请日：2005-08-09
申请人： I-Min Chin , Chien-Wen Lai
发明人： I-Min Chin , Chien-Wen Lai
IPC分类号： B08B5/02
CPC分类号： G02F1/1333 , G02F2001/1316
摘要： An automatic air-blown cleaning apparatus for cleaning a liquid crystal display (LCD) component in an LCD assembly process. The automatic air-blown cleaning apparatus has an assembly station for receiving and assembling the liquid crystal display component, a conveying device for delivering the liquid crystal display component to the next assembly station, and an air filtering blower provided on the conveying device. The air filtering blower sends an air flow toward the liquid crystal display component to remove residual matter from the liquid crystal display component.
摘要翻译： 一种用于在LCD组装过程中清洗液晶显示器（LCD）部件的自动吹风清洁装置。 自动吹风清洁装置具有用于接收和组装液晶显示部件的组装站，用于将液晶显示部件输送到下一个组装站的输送装置和设置在输送装置上的空气过滤鼓风机。 空气过滤鼓风机向液晶显示部件发送空气流以从液晶显示部件除去残留物。
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10.发明授权Automatic air-blown cleaning device for liquid crystal display component in LCD assembly and method thereof 有权LCD组装液晶显示元件自动吹风清洗装置及其方法公开(公告)号：US07100235B2
公开(公告)日：2006-09-05
申请号：US10618532
申请日：2003-07-11
申请人： I-Min Chin , Chien-Wen Lai
发明人： I-Min Chin , Chien-Wen Lai
IPC分类号： B08B5/02
CPC分类号： G02F1/1333 , G02F2001/1316
摘要： An automatic air-blown cleaning apparatus for cleaning a liquid crystal display (LCD) component in an LCD assembly process. The automatic air-blown cleaning apparatus has an assembly station for receiving and assembling the liquid crystal display component, a conveying device for delivering the liquid crystal display component to the next assembly station, and an air filtering blower provided on the conveying device. The air filtering blower sends an air flow toward the liquid crystal display component to remove residual matter from the liquid crystal display component.
摘要翻译： 一种用于在LCD组装过程中清洗液晶显示器（LCD）部件的自动吹风清洁装置。 自动吹风清洁装置具有用于接收和组装液晶显示部件的组装站，用于将液晶显示部件输送到下一个组装站的输送装置和设置在输送装置上的空气过滤鼓风机。 空气过滤鼓风机向液晶显示部件发送空气流以从液晶显示部件除去残留物。
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