摘要:
Provided is a radiation-sensitive colored composition that enables formation of color cured films in which color concentration unevenness is inhibited and which have uniform color and exhibit a superior development property and excellent pattern formability in the formation of color patterns.The radiation-sensitive colored composition contains (A) a dye polymer containing a structural unit having a dye structure polymerized using a chain-transfer agent having a LogP value of 5 or less, and (B) a solvent.
摘要:
The object of the present invention is to provide a radiation-sensitive colored composition which can supress the generation of the contamination of the device.A radiation-sensitive colored composition including: (A) a dye containing of from 10 ppm to 1000 ppm of a halogen ion; (B) a polymerizable compound; and (C) a solvent.