3D Microscope And Methods Of Measuring Patterned Substrates
    3.
    发明申请
    3D Microscope And Methods Of Measuring Patterned Substrates 审中-公开
    3D显微镜和测量图案基板的方法

    公开(公告)号:US20160253813A1

    公开(公告)日:2016-09-01

    申请号:US15150406

    申请日:2016-05-09

    Abstract: A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.

    Abstract translation: 用于图案化衬底测量的三维(3D)显微镜可以包括物镜,反射照明器,透射照明器,聚焦调节装置,光学传感器和处理器。 聚焦调节装置可以在多个Z步骤自动调节物镜焦点。 光学传感器能够在这些Z步骤的每个步骤中获取图像。 处理器可以控制反射照明器,透射照明器,聚焦调节装置和光学传感器。 处理器可以被配置成以多个Z步骤捕获第一和第二图像,第一图像使用反射照明器的图案,而不使用反射照明器和透射照明器之一的图案的第二图像。

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