Apparatus and method for detection of edge damages
    8.
    发明申请
    Apparatus and method for detection of edge damages 审中-公开
    用于检测边缘损伤的装置和方法

    公开(公告)号:US20080203388A1

    公开(公告)日:2008-08-28

    申请号:US11712355

    申请日:2007-02-28

    IPC分类号: H01L23/58 H01L21/66

    摘要: Embodiments of the invention enable detection of edge damages in semiconductor devices. To this purpose, one or more continuity structures may be provided, where each structure comprises an undulating arrangement disposed between active circuits of the semiconductor device and a perimeter of the metallization layers. The continuity structure(s) forms one or more conductive paths intersecting a plurality of metallization layers in the semiconductor device. A relative change in an electrical characteristic of the continuity structure(s) is monitored to ascertain whether or not an edge damage is present.

    摘要翻译: 本发明的实施例能够检测半导体器件中的边缘损伤。 为此,可以提供一个或多个连续性结构,其中每个结构包括布置在半导体器件的有源电路和金属化层的周边之间的起伏布置。 连续性结构形成与半导体器件中的多个金属化层交叉的一个或多个导电路径。 监视连续性结构的电特性的相对变化,以确定是否存在边缘损伤。

    Spinner toy
    9.
    外观设计

    公开(公告)号:USD965692S1

    公开(公告)日:2022-10-04

    申请号:US29819424

    申请日:2021-12-15

    申请人: Jun He

    设计人: Jun He

    Selective removal of on-die redistribution interconnects from scribe-lines
    10.
    发明授权
    Selective removal of on-die redistribution interconnects from scribe-lines 有权
    从划线中选择性地去除片上再分配互连

    公开(公告)号:US08704336B2

    公开(公告)日:2014-04-22

    申请号:US11848879

    申请日:2007-08-31

    IPC分类号: H01L23/544

    摘要: Selective removal of on-die redistribution interconnect material from a scribe-line region is generally described. In one example, an apparatus includes a first semiconductor die having a redistribution layer comprising redistribution dielectric and one or more redistribution metal interconnects, a second semiconductor die coupled with the first semiconductor die, the second semiconductor die having a redistribution layer comprising redistribution dielectric and one or more redistribution metal interconnects, and a scribe-line region disposed between the first semiconductor die and second semiconductor die, the scribe-line region having a majority or substantially all of redistribution dielectric or redistribution metal, or suitable combinations thereof, selectively removed to enable die singulation through the scribe-line region.

    摘要翻译: 通常描述从划线区域选择性地去除片上再分布互连材料。 在一个示例中,一种装置包括具有再分布层的第一半导体管芯,其包括再分布电介质和一个或多个再分布金属互连,与第一半导体管芯耦合的第二半导体管芯,第二半导体管芯具有包括再分布电介质的再分配层和一个 或更多的再分配金属互连,以及设置在第一半导体管芯和第二半导体管芯之间的划线区域,划分线区域具有大部分或基本上全部的再分布电介质或再分配金属或其合适的组合, 通过划线区划分。