摘要:
The invention relates to a measurement device (10) for measuring light (200) from a light source (2), comprising an optical unit (30) with a delay element (31) for splitting a polarized light beam (210) of the light (200) into a first partial beam (211) and a second partial beam (212), which have a defined phase shift relative to one another. Furthermore, the invention relates to a measurement system (1), as well as a measurement method (100).
摘要:
A method for analyzing stress in an object according to spectrum data is provided. The spectrum data is obtained from an interference fringe pattern of the object that results from performing photoelasticity. The method includes: analyzing the spectrum data to obtain three sets of intensity data related respectively to different wavelengths of light used in photoelasticity; calculating wrapped phases according to the three sets of intensity data, respectively; calculating preliminary stress values according to the wrapped phases, respectively; determining a system of stress equations according to a relation among the preliminary stress values; and calculating an estimated stress value using the system of stress equations.
摘要:
A multi-core fiber includes multiple optical cores, and for each different core of a set of different cores of the multiple optical cores, a total change in optical length is detected. The total change in optical length represents an accumulation of all changes in optical length for multiple segments of that different core up to a point on the multi-core fiber. A difference is determined between the total changes in optical length for cores of the set of different cores. A twist parameter and/or a bend angle associated with the multi-core fiber at the point on the multi-core fiber is/are determined based on the difference.
摘要:
An accurate measurement method and apparatus using an optical fiber are disclosed. A total change in optical length in an optical core in the optical fiber is determined that reflects an accumulation of all of the changes in optical length for multiple segment lengths of the optical core up to a point on the optical fiber. The total change in optical length in the optical core is provided for calculation of an average strain over a length of the optical core based on the detected total change in optical length.
摘要:
The present invention provides a tool for and method of using an infrared transmission technique to extract the full stress components of the in-plane residual stresses in thin, multi crystalline silicon wafers including in situ measurement of residual stress for large cast wafers. The shear difference method is used to obtain full stress components by integrating the shear stress map from the boundaries. System ambiguity at the boundaries is resolved completely by introducing a new analytical function. A new anisotropic stress optic law is provided, and stress optic coefficients are calibrated for different crystal grain orientations and stress orientations.
摘要:
The present disclosure includes disclosure of devices, and methods to resolve microscopic structures. In at least one exemplary embodiment, a visualization apparatus comprises a source arm having a light source operable to emit a light beam, wherein the light beam defines a beam pathway, a reference arm comprising a reflecting surface positioned within the beam pathway, a sample arm comprising a wavefront sensor, an adaptive optics wavefront corrector, and a target, each of which are positioned within the beam pathway, wherein the adaptive optics wavefront sensor is operable to compensate for at least one aberration in the light beam, a detector arm comprising a beam detector positioned within the beam pathway, wherein the beam detector is operable to detect the reflected light beam from the reference arm and the target, and wherein the visualization apparatus is operable to minimize at least one aberration of the target.
摘要:
An accurate measurement method and apparatus are disclosed for shape sensing with a multi-core fiber. A change in optical length is detected in ones of the cores in the multi-core fiber up to a point on the multi-core fiber. A location and/or a pointing direction are/is determined at the point on the multi-core fiber based on the detected changes in optical length. The accuracy of the determination is better than 0.5% of the optical length of the multi-core fiber up to the point on the multi-core fiber. In a preferred example embodiment, the determining includes determining a shape of at least a portion of the multi-core fiber based on the detected changes in optical length.
摘要:
A method, computer program product and system for analyzing multispectral images from a plurality of regions of birefringent material, such as a polymer film, using polarized light and a corresponding polar analyzer to identify differential strain in the birefringent material. For example, the birefringement material may be low-density polyethylene (LDPE), high-density polyethylene (HDPE), polypropylene, polyethylene terephthalate (PET), polyvinyl chloride (PVC), polyvinylidene chloride, polyester, nylon, or cellophane film. Optionally, the method includes generating a real-time quantitative strain map.
摘要:
A method, computer program product and system for analyzing multispectral images from a plurality of regions of birefringent material, such as a polymer film, using polarized light and a corresponding polar analyzer to identify differential strain in the birefringent material. For example, the birefringement material may be low-density polyethylene (LDPE), high-density polyethylene (HDPE), polypropylene, polyethylene terephthalate (PET), polyvinyl chloride (PVC), polyvinylidene chloride, polyester, nylon, or cellophane film. Optionally, the method includes generating a real-time quantitative strain map.
摘要:
A film thickness measurement apparatus (1) comprises an ellipsometer (3) for acquiring a polarization state of a film on a substrate (9) and a light interference unit (4) for acquiring spectral intensity of the film on the substrate (9). In an optical system (45) of the light interference unit (4), a light shielding pattern (453a) is disposed in an aperture stop part (453), and an illumination light from a light source (41) is emitted to the substrate (9) through the optical system (45). A reflected light from the substrate (9) is guided to a light shielding pattern imaging part (43), where an image of the light shielding pattern (453a) is acquired. When the ellipsometer (3) performs a film thickness measurement, a tilt angle of the substrate (9) is obtained on the basis of the image of the light shielding pattern (453a) and a light receiving unit (32) acquires a polarization state of the reflected light. An calculation part (51) obtains a thickness of a film with high precision from the polarization state of the reflected light by using the obtained tilt angle.