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    APPARATUS AND METHOD FOR SMART MATERIAL ANALYSIS
    1.
    发明申请
    APPARATUS AND METHOD FOR SMART MATERIAL ANALYSIS 审中-公开

    公开(公告)号：US20180328722A1

    公开(公告)日：2018-11-15

    申请号：US15594116

    申请日：2017-05-12

    Applicant: Saudi Arabian Oil Company

    Inventor： Enrico BOVERO

    IPC: G01B11/16

    CPC classification number: G01B11/16 ,  G01B11/165 ,  G01L1/241 ,  G01M5/0075 ,  G01M5/0091 ,  G01M11/081

    Abstract: A method of inspecting a structure including a photonic material using a movable inspection apparatus includes irradiating a section of the structure, receiving radiation diffracted from a photonic material in the section of the structure, determining a deformation of the photonic material as a function of at least one of i) an intensity of the radiation received ii) a position of the radiation received and iii) a wavelength of the radiation received, and determining if a magnitude of the deformation is higher than a threshold. If the magnitude of the deformation is higher than the threshold data is stored concerning the deformation of the photonic material; contrarily, if the magnitude of the deformation is not higher than the threshold: the inspection at the location of the photonic material is stopped and the inspection apparatus is moved in order to inspect another section of the structure.

    STRAIN SENSOR AND RECORDING MEDIUM
    4.
    发明申请
    STRAIN SENSOR AND RECORDING MEDIUM 审中-公开

    公开(公告)号：US20180113036A1

    公开(公告)日：2018-04-26

    申请号：US15793348

    申请日：2017-10-25

    Applicant: Konica Minolta, Inc.

    Inventor： Hideo UEMURA ,  Kazuki IKEDA ,  Makoto OOKI

    IPC: G01L1/24 ,  G01B11/16

    CPC classification number: G01L1/241 ,  G01B11/16 ,  G01B11/18

    Abstract: A strain sensor includes a marker, detectors and a calculator. The marker is disposed on a surface of a measurement object and includes a strain body and surface plasmon generating particles. In the strain body, a strain is formed by a load. The surface plasmon generating particles are arranged in two directions which are parallel to two in-plane directions of a light receiving surface of the strain body. The first detector detects a spectral intensity of a light which has been reflected on the marker or has passed through the marker. The second detector detects absorption spectral peaks corresponding to the respective array directions of the particles from the spectral intensity. The calculator calculates the quantity of the strain of the marker based on a difference in wavelength of the two absorption spectral peaks.

    Stress measuring method, stress measuring member, and stress measuring set
    6.
    发明授权
    Stress measuring method, stress measuring member, and stress measuring set 有权

    公开(公告)号：US09897496B2

    公开(公告)日：2018-02-20

    申请号：US15292469

    申请日：2016-10-13

    Applicant: FUJIFILM Corporation

    Inventor： Takahiro Hayashi

    IPC: G01B11/16 ,  G01L1/24 ,  C08G61/00

    CPC classification number: G01L1/241 ,  C08G61/00 ,  C08G61/08 ,  C08G2261/3325 ,  C08G2261/418 ,  G01B11/16

    Abstract: The present invention provides a stress measuring method including: irradiating a photoelastic product including a measurement subject with light penetrating a linear polarizing film and a phase difference film in this order, and detecting reflected light from the product which is derived from the light via the phase difference film and the linear polarizing film in this order, in which in-plane retardation Re (550) of the phase difference film with light having a wavelength of 550 nm satisfies 100 nm≦Re (550 nm)≦700 nm, and in-plane retardation Re (450) of the phase difference film with light having a wavelength of 450 nm satisfies Re (450)/Re (550)≧0.9, a stress measuring member including the linear polarizing film and the phase difference film, and a stress measuring set including the stress measuring member and a stress displaying member including a photoelastic layer.

    OPTICAL SYSTEM AND METHODS FOR THE DETERMINATION OF STRESS IN A SUBSTRATE
    8.
    发明申请
    OPTICAL SYSTEM AND METHODS FOR THE DETERMINATION OF STRESS IN A SUBSTRATE 审中-公开

    公开(公告)号：US20170199027A1

    公开(公告)日：2017-07-13

    申请号：US15313897

    申请日：2015-05-28

    Applicant: BROWN UNIVERSITY

    Inventor： Humphrey J. MARIS

    IPC: G01B11/16 ,  G01L1/24

    CPC classification number: G01B11/16 ,  G01L1/24 ,  G01L1/241 ,  G01L5/166 ,  H01L22/12

    Abstract: Methods and systems are disclosed for measuring multidimensional stress characteristics in a substrate. Generally, the methods include applying a sequence of optical pump pulses to the substrate. The optical pump pulses induce a propagating strain pulse in the substrate. Optical probe pulses are also applied. By analyzing transient optical responses caused by the propagating strain pulse, multidimensional stress components characterizing the stress in the substrate can be determined. Multidimensional stress components may also be determined at a depth of a substrate. Multidimensional stress components may also be determined at areas adjacent a through-silicon via.

    STRESS MEASURING METHOD, STRESS MEASURING MEMBER, AND STRESS MEASURING SET
    9.
    发明申请
    STRESS MEASURING METHOD, STRESS MEASURING MEMBER, AND STRESS MEASURING SET 有权
    应力测量方法，应力测量成员和应力测量集

    公开(公告)号：US20170030785A1

    公开(公告)日：2017-02-02

    申请号：US15292469

    申请日：2016-10-13

    Applicant: FUJIFILM Corporation

    Inventor： Takahiro HAYASHI

    IPC: G01L1/24

    CPC classification number: G01L1/241 ,  C08G61/00 ,  C08G61/08 ,  C08G2261/3325 ,  C08G2261/418 ,  G01B11/16

    Abstract: The present invention provides a stress measuring method including: irradiating a photoelastic product including a measurement subject with light penetrating a linear polarizing film and a phase difference film in this order, and detecting reflected light from the product which is derived from the light via the phase difference film and the linear polarizing film in this order, in which in-plane retardation Re (550) of the phase difference film with light having a wavelength of 550 nm satisfies 100 nm≦Re (550 nm)≦700 nm, and in-plane retardation Re (450) of the phase difference film with light having a wavelength of 450 nm satisfies Re (450)/Re (550)≧0.9, a stress measuring member including the linear polarizing film and the phase difference film, and a stress measuring set including the stress measuring member and a stress displaying member including a photoelastic layer.

    Abstract translation: 本发明提供一种应力测定方法，其特征在于，包括以下顺序对包含测定对象物的光弹射入线偏振膜和相位差膜的光弹性体进行照射，并且经由相位检测来自光的产物的反射光 具有波长550nm的光的相位差膜的面内相位差Re（550）满足100nm≤Re（550nm）≤700nm的顺序的差分膜和线偏振膜， 具有450nm波长的相位差膜的平面延迟Re（450）满足Re（450）/ Re（550）≥0.9，包括线偏振膜和相位差膜的应力测量部件和应力 包括应力测量构件的测量组和包括光弹性层的应力显示构件。

    METHODS FOR IN-PLANE STRAIN MEASUREMENT OF A SUBSTRATE
    10.
    发明申请
    METHODS FOR IN-PLANE STRAIN MEASUREMENT OF A SUBSTRATE 审中-公开
    基板的面内应变测量方法

    公开(公告)号：US20160363492A1

    公开(公告)日：2016-12-15

    申请号：US15154959

    申请日：2016-05-14

    Applicant: ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY

    Inventor： Hongbin Yu ,  Hanqing Jiang ,  Hanshuang Liang ,  Teng Ma

    IPC: G01L1/24

    CPC classification number: G01L1/241 ,  G01L1/00 ,  G01L1/24 ,  H01L22/12 ,  Y10T428/24446

    Abstract: Methods for measuring and/or mapping in-plane strain of a surface of a substrate. A grating is formed on at least a portion of the surface of the substrate. A laser is then used focused onto the grating to determine the strain on the surface by determining the variation of the grating wavelength due to the strain on the surface. The strain information is essentially carried by the grating, in terms of grating wavelength, because it varies according to the volume change of the underlying substrates. By scanning the surface grating with the small laser size, a high resolution strain map of the surface can be produced. The induced strain is related to the grating wavelength variation, which leads to the diffraction angle variation that is captured by the strain sensing measurements.

    Abstract translation: 用于测量和/或映射衬底表面的面内应变的方法。 在基板表面的至少一部分上形成光栅。 然后将激光器聚焦到光栅上，以通过确定由于表面上的应变引起的光栅波长的变化来确定表面上的应变。 根据光栅波长，应变信息基本上由光栅承载，因为它根据下面的基底的体积变化而变化。 通过以小的激光尺寸扫描表面光栅，可以产生表面的高分辨率应变图。 感应应变与光栅波长变化有关，这导致了应变感测测量所捕获的衍射角变化。

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