公开(公告)号：US20040120753A1

公开(公告)日：2004-06-24

申请号：US10730980

申请日：2003-12-10

Inventor： Gerard Gieux

IPC: B05C019/04

CPC classification number: A45D33/02

Abstract: A powder applicator includes a reservoir for powder and a porous membrane tensioned over the reservoir. A portion of the powder is stored in the vicinity of the membrane, in a very open synthetic foam pad between the reservoir and the membrane and communicating with the reservoir.

Abstract translation: 粉末施加器包括用于粉末的储存器和在储存器上张紧的多孔膜。 将一部分粉末储存在膜的附近，在储存器和膜之间的非常开放的合成泡沫垫中并与储存器连通。

公开(公告)号：US20030161675A1

公开(公告)日：2003-08-28

申请号：US10300673

申请日：2002-11-19

Inventor： Young-Gu Lee

IPC: A45D033/02 ,  B05C019/04

CPC classification number: A45D33/02 ,  A45D33/34

Abstract: Disclosed is a cosmetic powder applicator. The powder applicator includes a powder container, an elastic structure connected to the container and a powder-permeable soft cover enclosing the elastic structure. The structure has an elasticity sufficient to substantially bend upon application of pressure thereto and to substantially recover an original shape thereof upon release of the pressure. The soft cover is so configured as to retain therein and pass powder particles through itself. The powder applicator is configured such that, by turning or shaking the applicator, the powder to be contained in the container can be discharged through the discharge opening toward the soft cover and the structure enclosed therein. Further disclosed is methods of making and using the powder applicator. The method of making includes a feature of connecting the elastic structure enclosed in the soft cover with the container such that the powder to be contained in the container can be discharged through the discharge opening toward the structure and the soft cover. The method of using the powder applicator includes a feature of contacting the soft cover with a skin, applying pressure onto the soft cover and the elastic structure thereunder such that the structure is substantially bent while maintaining structural rigidity thereof and releasing the pressure so as to allow the structure to recover an original shape thereof. The powder retained in the soft cover is transferred to the skin in the course of one or more of the contacting with the skin, and the application and release of the pressure.

Abstract translation: 公开了一种化妆品粉末涂布器。 粉末施加器包括粉末容器，连接到容器的弹性结构和包围弹性结构的粉末可渗透的软覆盖​​层。 该结构具有足够的弹性，以便在施加压力时基本上弯曲，并且在释放压力时基本恢复其原始形状。 软盖被配置成保持在其中并通过其自身的粉末颗粒。 粉末施加器被构造成使得通过转动或摇动施加器，容纳在容器中的粉末可以通过排出开口朝着软质盖和其中包围的结构排出。 进一步公开了制造和使用粉末涂布器的方法。 制造方法包括将包封在软盖中的弹性结构与容器连接的特征，使得容纳在容器中的粉末能够通过排出口朝向结构和软质盖排出。 使用粉末施加器的方法包括使软覆盖物与皮肤接触的特征，将软压盖和其上的弹性结构施加压力，使得结构基本上弯曲，同时保持其结构刚度并释放压力，以允许 恢复其原始形状的结构。 保持在软盖中的粉末在与皮肤接触的一个或多个过程中被转移到皮肤，并且施加和释放压力。

公开(公告)号：US20030123919A1

公开(公告)日：2003-07-03

申请号：US10304084

申请日：2002-11-26

Inventor： Jean-Louis H. Gueret

IPC: A46B011/00 ,  B05C019/04

CPC classification number: A45D34/00 ,  A45D34/04 ,  A45D44/002 ,  A45D2200/1018 ,  A45D2200/1036

Abstract: A device for at least one of applying a product to a surface and packaging a product may include at least one element that may include at least one substance, and at least one of the product and the surface receiving the product may be enabled to contact the at least one substance. Alternatively, or in addition, the at least one element may generate at least one of an electric field and a magnetic field, and at least one of the product and the surface may be enabled to be subjected to the field generated by the at least one substance. Other devices as well as methods are also disclosed.

Abstract translation: 用于将产品施加到表面并包装产品中的至少一种的装置可以包括可以包括至少一种物质的至少一种元件，并且可以使产品和接收产品的表面中的至少一种可以接触 至少一种物质。 或者或另外，至少一个元件可以产生电场和磁场中的至少一个，并且产品和表面中的至少一个可以被施加到由至少一个元件产生的场 物质。 还公开了其它装置以及方法。

公开(公告)号：US20020139666A1

公开(公告)日：2002-10-03

申请号：US09681402

申请日：2001-03-29

Inventor： Paul Hsueh ,  Shyang Chang ,  Hans Schiesser ,  Michael Ma ,  Jack Hsu ,  Abraham C. Ma

IPC: C23C014/04 ,  C23C014/10 ,  C23C014/46 ,  B05C019/04

CPC classification number: C23C14/46 ,  C23C14/044 ,  C23C14/547

Abstract: A vacuum chamber deposits thin films on a substrate by sputtering a target. The beam of atoms or ions from the target is partially blocked by a shadow or adjustable uniformity mask, reducing the deposition rate onto the substrate. The adjustable uniformity mask has several adjustable fingers. The fingers extend or retract to enlarge or reduce the size of the mask. Each finger covers a different annular region or radius of the substrate. The deposition rate at different substrate radii is thus adjustable by the fingers. Several optical beams monitor the film transmittance at different substrate radii. A transmittance profile is continually generated during deposition. As deposition proceeds, radii with a thicker film have their fingers extended to reduce their deposition rate, producing a more uniform film thickness across all radii. Motors extend or retract the individual fingers.

Abstract translation: 真空室通过溅射靶材在衬底上沉积薄膜。 来自目标的原子或离子束被阴影或可调整的均匀掩模部分阻挡，从而降低了沉积到衬底上的速度。 可调均匀面具有几个可调节的手指。 手指伸展或缩回以扩大或减小面罩的尺寸。 每个手指覆盖基板的不同的环形区域或半径。 因此，通过手指调节不同基底半径处的沉积速率。 几个光束监测不同衬底半径处的膜透射率。 在沉积期间不断产生透射率分布。 随着沉积的进行，具有较厚膜的半径具有伸长的手指以降低其沉积速率，从而在所有半径上产生更均匀的膜厚度。 电机延伸或缩回各个手指。