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公开(公告)号:US07157135B2
公开(公告)日:2007-01-02
申请号:US10863621
申请日:2004-06-09
IPC分类号: B32B7/02 , B32B18/00 , B32B27/06 , B32B27/08 , B32B27/32 , B32B32/36 , B32B32/34 , B32B37/16
CPC分类号: B32B27/08 , B32B37/153 , B32B38/06 , B32B2255/10 , B32B2255/20 , B32B2307/416 , C23C14/0629 , C23C14/541 , C23C14/562 , Y10S428/91 , Y10T428/24942 , Y10T428/24967 , Y10T428/24975 , Y10T428/26 , Y10T428/263 , Y10T428/265 , Y10T428/269 , Y10T428/31504 , Y10T428/31507 , Y10T428/31678 , Y10T428/31681 , Y10T428/31692 , Y10T428/31699 , Y10T428/31703 , Y10T428/31721 , Y10T428/31725 , Y10T428/31736 , Y10T428/31739 , Y10T428/3175 , Y10T428/31786 , Y10T428/31797 , Y10T428/31855 , Y10T428/31909 , Y10T428/31935 , Y10T428/31938 , Y10T428/31971
摘要: An embossable film for creating holograms and diffraction gratings and methods of producing the embossable films are provided. The embossable film includes a base layer and a co-extruded embossable layer that is coated with a transparent high refractive index (HRI) coating prior to embossing.
摘要翻译: 提供了一种用于产生全息图的可压纹膜和衍射光栅以及制造可压印膜的方法。 可压花膜包括基底层和在压花之前涂覆有透明高折射率(HRI)涂层的共挤出可压花层。